大阪大学 産業科学研究所 量子ビーム物質科学研究分野 古澤研究室

研究業績

論文2017〜2012】【論文2011〜2010】【論文2009〜2007】【論文2006〜2005

論文 2017年

  • Sensing Mechanisms in the Redox-Regulated, [2Fe-2S] Cluster-Containing, Bacteria Transcriptional Factor SoxR
      K. Kobayashi
      Accounts of Chemical Research in press
  • Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10nm half-pitch resolution region
      T. Kozawa, J. J. Santillan, and T. Itani,
      Jpn. J. Appl. Phys. 56 (2017) 016501.
  • Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography
      T. Kozawa, J. J. Santillan, and T. Itani,
      Jpn. J. Appl. Phys. 56 (2017) 066501.
  • Sensitivity enhancement of chemically amplified EUV resist by adding acid generation promoters
      S. Fujii, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Itani
      Jpn. J. Appl. Phys. 56 (2017) 06GD01-1
  • Rational Tuning of Superoxide Sensitivity in SoxR, the [2Fe-2S] Transcription Factor: Implications of Species-Specific Lysine Residues
      M. Fujikawa, K. Kobayashi, Y. Tsutsui, T. Tanaka, T. Kozawa
      Biochemistry, 56 (2017) 403
  • Formation of Au nanoparticle arrays on hydrogel 2-D patterns based on poly(vinylpyrrolidone)
      S. Tsukuda, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Omata
      Jpn. J. Appl. Phys. 56 (2017) 06GD01
  • Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified electron beam resist process
      T. Kozawa
      Jpn. J. Appl. Phys, 56 (2017) 046502
  • Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam
      H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J.-L. Marignier, M. Mostafavi,
      and J. Belloni
      J. Phys. Chem. C 121 (2017) 5335
  • Fabrication of a Si lever structure made by double-angle etching with reactive gas cluster injection
      T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, and J. Matsuo
      Appl. Phys. Lett. 110 (2017) 182105
  • Angled ethching of Si by ClF3-Ar gas cluster injection
      T. Seki, H. Yamamoto, T. Kozawa, T. Shoji, K. Koike, T. Aoki, and J. Matsuo
      Jpn. J. Appl. Phys. 56 (2017) 06HB02

論文 2016年

  • Dynamics of radical cations of PHS in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution
      K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
      Chem. Phys. Lett. 657 (2016) 44
  • Optical trapping of nanoparticles on a silicon subwavelength grating and their detectin by an ellipsometric technique.
      N. Taki, Y. Mizutani, T. Iwata, T. Kojima, H. Yamamoto, T. Kozawa
      International Journal of Optomechatronics 10 (2016) 24.
  • Ab initio spur size calculation in liquid water at room temperature
      Y. Muroya, A. Mozumder
      Chemical Physics Letters, 657 (2016) 102
  • Local density augmentation of supercritical water probed by 4,40-bpyH
    radical: A pulse radiolysis study"
      Z. Liu, Z. Fang, Y. Muroya, H. Fu, Yu Yan, Y. Katsumura, M. Lin
      Chemical Physics Letters, 657 (2016) 78
  • Redox-Dependent Dynamics in Heme-Bound Bacterial Iron Response Regulator (Irr) Protein
      K. Kobayashi, M. Nakagaki, H. Ishikawa, K. Iwai, M. R. O'Brian, and K. Ishimori
      Biochemistry, 55 (2016) 4047
  • Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Validation of simulation model
      T. Kozawa,
      Jpn. J. Appl. Phys, 55 (2016) 056503
  • Analysis of stochastic effects in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist
      T. Kozawa, J. J. Santillan, and T. Itani,
      Jpn. J. Appl. Phys. 55 (2016) 076501.
  • Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high NA exposure tool of extreme ultraviolet lithography
      T. Kozawa, J. J. Santillan, T. Itani
      Jpn. J. Appl. Phys, 55 (2016) 096501
  • Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size
      T. Kozawa
      Jpn. J. Appl. Phys, 55 (2016) 106502
  • Theoretical study of relationships among resolution, line width roughness, and sensitivity of chemically amplified extreme ultraviolet resists with photodecomposable quenchers
      T. Kozawa, J. J. Santillan, T. Itani
      Jpn. J. Appl. Phys, 55 (2016) 116501
  • Requirement for Suppression of Line Width Roughness in Fabrication of Line-and-Space Patterns with 7 nm Quarter-Pitch Using Electron Beam Lithography with Chemically Amplified Resist Process,
      T. Kozawa
      J. Photopolym.. Sci. Tech. 29 (2016) 809
  • Chemically Amplified Molecular Resists based on Noria Derivatives Containing Adamantyl Ester Groups for Electron Beam Lithography
      H. Yamamoto, S. Tagawa, H. Kudo, K. Okamoto, and T. Kozawa
      J. Vac. Sci. Technol. B 34 (2016) 041606
  • Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly
      H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa,
      J. Photopolym. Sci. Technol. 29 (2016) 765
  • Structural Control of Hybrid Colloidal Particle Surface by Plasma-etching Treatment
      A. Ohnuma, H. Yamamoto, T. Kozawa, and B. Ohtani
      Chem. Lett. 45 (2016) 979
  • Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups
      H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa
      J. Photopolym. Sci. Technol. 29 (2016) 495
  • Challenges in Development of Sub-10 nm Resist Materials
      T. Kozawa, J. J. Santillan, and T. Itani,
      J. Photopolym. Sci. Technol. 29 (2016) 717-723.
  • Effect of thermalization distance on stochastic phenomena in 7-nm-half-pitch line-and-space pattern fabrication using chemically amplified extreme ultraviolet resists
      T. Kozawa, J. J. Santillan, and T. Itani,
      Jpn. J. Appl. Phys. 55 (2016) 026504

総説 2016年

  • OVERVIEW OF THE PHYSIOLOGICAL REACTIONS OF THE MONODEHYDROASCORBATE RADICAL.
      Kazuo Kobayashi
      Ascorbic Acid: Properties, Synthesis and Applications Editors: Emma Parsons, Nova Science Publishers 1-28

論文 2015年

  • S. Fujii, T. Kozawa, K. Okamoto, J. J. Santillan, and T. Itani
    Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 54 (2015) 116501
  • T. Kozawa
    Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists
    Jpn. J. Appl. Phys. 54 (2015) 126501
  • T. Kozawa
    Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 54 (2015) 016502
  • T. Kozawa
    Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch (7nm space width and 21nm line width) using electron beam lithography with chemically amplified resist processes: I. Relationship between sensitivity and chemical gradient
    Jpn. J. Appl. Phys. 54 (2015) 056501
  • T. Kozawa
    Effects of diffusion constant of photodecomposable quencher on chemical gradient of chemically amplified extreme-ultraviolet resists
    Jpn. J. Appl. Phys. 54 (2015) 056502
  • T. Kozawa, J. J. Santillan, and T. Itani
    Effect of thermalization distance on chemical gradient of line-and-space patterns with 7 nm half-pitch in chemically amplified extreme ultraviolet resists,
    Jpn. J. Appl. Phys. 54 (2015) 066501
  • N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
    Study on radiation chemistry of fluorinated polymers for EUV resist
    Jpn. J. Appl. Phys. 54 (2015) 06FE03
  • M. Fujikawa, K. Kobayashi, and T. Kozawa
    Redox-dependent DNA distortion in a SoxR protein-promoter complex studied using fluorescent probes
    J. Biochem. 157 (2015) 389
  • S. Fujii, T. Kozawa, K. Okamoto, J. J. Santillan, and T. Itani
    Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement
    Jpn. J. Appl. Phys. 54 (2015) 086502
  • T. Kozawa
    Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist processes: II. Stochastic effects
    Jpn. J. Appl. Phys. 54 (2015) 096501
  • T. Kozawa
    Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: III. Post exposure baking on quartz substrates
    Jpn. J. Appl. Phys. 54 (2015) 096703
  • M. Mitsuyasu, H. Yamamoto, and T. Kozawa
  • Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography
    J. Photopolym. Sci. Technol. 28 (2015) 119

  • H. Kudo, S. Matsubara, H. Yamamoto, and T. Kozawa
    Synthesis and Resist Properties of Hyperbranched Polyacetals
    J. Photopolym. Sci. Technol. 28 (2015) 125
  • H. Kudo, S. Matsubara, H. Yamamoto, and T. Kozawa
    Synthesis of Hyperbranched Polyacetals via An + B2-Type Polyaddition (n=3, 8, 18, and 21): Candidate Resists for Extreme Ultraviolet Lithography
    J. Polym. Sci. Part A: Polym. Chem. 53 (2015) 2343
  • T. Kozawa, J. J. Santillan, and T. Itani
    Quencher diffusion in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist
    Jpn. J. Appl. Phys. 54 (2015) 118002
  • Y. Komuro, D. Kawana, T. Hirayama, K. Ohmori, and T. Kozawa
    Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation
    J. Photopolym. Sci. Technol. 28 (2015) 501
  • T. Kozawa
    Resist material options for extreme ultraviolet lithography,
    Adv. Opt. Techn. 4 (2015) 311
  • T. Kozawa, J. J. Santillan, and T. Itani
    Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography
    J. Photopolym. Sci. Technol. 28 (2015) 669
  • J. Ma, S. Yamashita, Y. Muroya, Y. Katsumura and M. Mostafavi
    Deciphering the reaction between a hydrated electron and a hydronium ion at elevated temperatures
    Phys. Chem. Chem. Phys. 17 (2015) 22934
  • Y. Komuro, D. Kawana, T. Hirayama, K. Ohomori, and T. Kozawa
    Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 54 (2015) 036506
  • T. Kozawa
    Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher
    Jpn. J. Appl. Phys. 54 (2015) 016503
  • K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
    Pulse radiolysis study of polystyrene-based polymers with added photoacid generators: Reaction mechanism of extreme-ultraviolet and electron-beam chemically amplified resist
    Jpn. J. Appl. Phys. 54 (2015) 026501
  • H. Yamamoto, H. Kudo, and T. Kozawa
    Study on resist performance of chemically amplifeid molecular resists based on cyclic oligomers
    Microelectron. Eng. 133 (2015) 16
  • T. Kozawa, J. J. Santillan, and T. Itani
    Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects
    Jpn. J. Appl. Phys. 54 (2015) 036507
  • K. Kobayashi, M. Fujikawa, and T. Kozawa
    Binding of Promoter DNA to SoxR Protein Decreases the Reduction Potential of the [2Fe-2S] Cluster
    Biochemistry 54 (2015) 334
  • T. Nakai, H. Ito, K. Kobayashi, Y. Takahashi, H. Hori, M. Tsubaki, K. Tanizawa, and T. Okajima
    The Radical S-Adenosyl-L-methionine Enzyme QhpD Catalyzes Sequential Formation of Intra-protein Sulfur-to-Methylene Carbon Thioether Bonds
    J. Biol. Chem. 292 (2015) 11144
  • H.Yamamoto, T. Seki , J. Matsuo , K. Koike, and T. Kozawa
    High-aspect-ratio patterning by ClF3-Ar neutral cluster etching
    Microelectron. Eng. 141 (2015) 145
  • K. Hata, A. Urushibara, S. Yamashita, M. Lin, Y. Muroya, N. Shikazono, A. Yokoya, H. Fu, and Y. Katsumura
    Chemical repair activity of free radical scavenger edaravone: reduction reactions with dGMP hydroxyl radical adducts and suppression of base lesions and AP sites on irradiated plasmid DNA
    J. Radiat. Res. 56 (2015) 59
  • S.Yamashita, K. Iwamatsu, Y. Maehashi, M. Taguchi, K. Hata, Y. Muroya, and Y. Katsumura
    Sequential radiation chemical reactions in aqueous bromide solutions: pulse radiolysis experiment and spur model simulation
    RSC Adv. 5 (2015) 25877
  • T. Kozawa
    Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher
    Jpn. J. Appl. Phys. 54 (2015) 016503
  • K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki
    Pulse radiolysis study of polystyrene-based polymers with added photoacid generators: Reaction mechanism of extreme-ultraviolet and electron-beam chemically amplified resist
    Jpn. J. Appl. Phys. 54 (2015) 026501
  • T. Kozawa, J. J. Santillan, and T. Itani
    Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects
    Jpn. J. Appl. Phys. 54 (2015) 036507

総説 2015年

  • 小林 一雄
    尿酸のラジカルスカベンジャーとしての生理的役割
    高尿酸血症と痛風 23 (2015) 114

論文 2014年

  • T. Kozawa, J. J. Santillan, and T. Itani
    Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 116504
  • S. Takei, A. Oshima, T. Oyama, K. Ito, M. Kashiwakura, T. Kozawa, S. Tagawa, and M. Hanabata
    Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 116505
  • T. Kozawa, J.J. Santillan, and T. Itani
    Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model
    Jpn. J. Appl. Phys. 53 (2014) 106501
  • T. Kozawa, J. J. Santillan, and T. Itani
    Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 084002
  • T. Kozawa, J. J. Santillan, and T. Itani
    Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 076502
  • S. Takei, A. Oshima, T. Ichikawa, A. Sekiguchi, M. Kashiwakura, T. Kozawa, S. Tagawa, T. Oyama, S. Ito, and H. Miyasaka
    Organic solvent-free water-developable sugar resist material derived from biomass in green lithography
    Microelectron. Eng. 122 (2014) 70
  • T. Kozawa and T. Hirayama
    Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet resists
    Jpn. J. Appl. Phys. 53 (2014) 066502
  • T. Kozawa
    Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 066508
  • T. Kozawa, J. J. Santillan, and T. Itani
    Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 066504
  • T. Kozawa, J. J. Santillan, and T. Itani
    Effects of effective reaction radius for neutralization on performance of chemically amplified resists
    Jpn. J. Appl. Phys. 53 (2014) 06JC02
  • T. Kozawa
    Relationship between stochasticity and wavelength of exposure source in lithography
    Jpn. J. Appl. Phys. 53 (2014) 066505
  • T. Kozawa, J. J. Santillan, and T. Itani
    Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists
    Jpn. J. Appl. Phys. 53 (2014) 036503
  • T. Kozawa, J. J. Santillan, and T. Itani
    Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography
    J. Photopolym. Sci. Technol. 27 (2014) 11
  • T. Kozawa and T. Hirayama
    Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists
    Jpn. J. Appl. Phys. 53 (2014) 016503
  • H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa
    Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatterns
    Microelectron. Eng. 121 (2014) 108
  • H. Yamamoto, T. Kozawa, and S. Tagawa
    Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method
    Microelectron. Eng. 129 (2014) 65
  • H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa
    Position Control of Metal Nanoparticles by Self-Assembly
    J. Photopolym. Sci. Technol. 27 (2014) 243
  • T. Amaya, Y. Abe, H. Yamamoto, T. Kozawa, and T. Hirao
    Conductivity of poly(2-methoxyaniline-5-phosphonic acid)/amine complex and its charge dissipation property in electron-beam lithography
    Synthetic Metals 198 (2014) 88
  • H. Horibe, K. Ishiguro, T. Nishiyama, A. Kono, K. Enomoto, H. Yamamoto, M. Endo, and S. Tagawa
    Sensitivity of a Chemically Amplified Three-component Resist Containing a Dissolution Inhibitor for Extreme Ultraviolet Lithography
    Polymer J. 46 (2014) 234
  • Y. Komuro, H. Yamamoto, K. Kobayashi, Y. Utsumi, K. Ohmoro, and T. Kozawa
    Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography
    Jpn. J. Appl. Phys. 53 (2014) 116503
  • K. Kobayashi, M. Fujikawa, and T. Kozawa
    Oxidative Stress Sensing by the Iron-Sulfur Cluster in the Transcription Factor, SoxR
    J. Inorg. Biochem. 133 (2014) 87
  • M. Fujikawa, K. Kobayashi, and T. Kozawa
    Mechanistic Studies on Formation of the Dinitrosyl Iron Complex of the [2Fe-2S] Cluster of SoxR Protein
    J. Biochem. 156 (2014) 163
  • K. Kobayashi, Y. Seike, A. Saeki, T. Kozawa, F. Takeuchi, and M. Tsubaki
    Pulse Radiolysis Study of the Dynamics of Ascorbic Acid Free Radicals within a Liposomal Environment
    PhysChemPhys 15 (2014) 2994
  • T. Kozawa and T. Hirayama
    Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists
    Jpn. J. Appl. Phys. 53 (2014) 016503

総説 2014年

  • Y. Katsumura, and Y. Muroya
    Chapter 5: Material-Coolant Interactions
    in Supercritical-Pressure Light Water Cooled Reactors, eds. by Y. Oka and H. Mori
    Springer Japan, ISBN: 978-4-431-55024-2 (2014) 347
  • 室屋裕佐
    3.1.4. パルスラジオリシス法 -中間活性種の検出手法
    原子力・量子・核融合事典(丸善出版)第IV分冊 (2014) 102.
  • 林銘章, 室屋裕佐
    3.1.5. 水溶液の放射線化学 -水および希薄水溶液の放射線分解
    原子力・量子・核融合事典(丸善出版)第IV分冊 (2014) 104

論文 2013年

  • T. Itani and T. Kozawa,
    Resist Materials and Processes for Extreme Ultraviolet Lithography,
    Jpn. J. Appl. Phys. 52 (2013) 010002
  • T. Kozawa,
    Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography,
    Jpn. J. Appl. Phys. 52 (2013) 016501
  • Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa,
    Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography,
    Appl. Phys. Express 6 (2013) 014001
  • T. Kozawa, J. J. Santillan, and T. Itani,
    Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography,
    Appl. Phys. Express 6 (2013) 026502
  • T. Kozawa and T. Hirayama,
    Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists
    Jpn. J. Appl. Phys. 52 (2013) 046502
  • T. Kondoh, J. Yang, K. Norizawa, K. Kan, T. Kozawa, A. Ogata, S. Tagawa, and Y. Yoshida
    Femtosecond pulse radiolysis study of geminate ion recombination in biphenyl-dodecane solution
    Radiat. Phys. Chem. 84 (2013) 30
  • T. Kozawa, J. J. Santillan, and T. Itani,
    Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
    Jpn. J. Appl. Phys. 52 (2013) 076502
  • T. Kozawa, J. J. Santillan, and T. Itani,
    Acid Diffusion Length in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography
    Jpn. J. Appl. Phys. 52 (2013) 076501.
  • T. Kozawa,
    Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography,
    Jpn. J. Appl. Phys. 52 (2013) 076504
  • H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J. -L. Marignier, M. Mostafavi, and J. Belloni
    Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA,
    Radiat. Phys. Chem. 91 (2013) 148
  • K. Okamoto, R. Matsuda, H. Yamamoto, T. Kozawa, S. Tagawa, R. Fujiyoshi, and T. Sumiyoshi,
    Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist,
    Jpn. J. Appl. Phys. 52 (2013) 06GC04
  • T. Kozawa and T. Hirayama,
    Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists,
    Jpn. J. Appl. Phys. 52 (2013) 086501
  • H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa,
    Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton,
    Microelectronic Engineering 110 (2013) 369
  • H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa,
    Controlled Array of Silver Nanoparticles on Nanopatterns,
    J. Photopolym. Sci. Technol. 26 (2013) 495
  • T. Kozawa
    Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists,
    J. Photopolym. Sci. Technol. 26 (2013) 643.
  • S. L. Butarbutar, Y. Muroya, L. M. Kohan, S. Sanguanmith, J. Meesungnoen, J.-P. Jay-Gerin
    On the Temperature Dependence of the RateConstant of the Bimolecular Reaction of two Hydrated Electrons, Atom Indonesia, 39 (2013) 51
  • A. Tsuda, R. Ishikawa, H. Koteishi, K. Tange, Y. Fukuda, K. Kobayashi, T. Inoue, and M.i Nojiri
    Structural and mechanistic insights into the electron-flow through protein for cytochrome c-tethering copper nitrite reductase
    J. Biochem 154 (2013) 51
  • R. Mariam; R., Rahman, F.Takeuchi, K. Kobayashi, M. Tsubaki, Electron transfer reactions of candidate tumor suppressor 101F6 protein, a cytochrome b561 homologue, with ascorbate and monodehydroascorbate radical
    Biochemistry 52(2013) 3660

論文 2012年

  • K. Enomoto, K. Arimitsu, A. Yoshizawa, R. Joshi, H. Yamamoto, A. Oshima, T. Kozawa, and S. Tagawa
    Acid Generation Mechanism for Extreme Ultraviolet Resists Containing Pinanediol Monosulfonate Acid Amplifiers: A Pulse Radiolysis Study
    Jpn. J. Appl. Phys., 51 (2012) 046502.
  • T. Kozawa,
    Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists,
    Jpn. J. Appl. Phys., 51 (2012) 06FC01
  • T. Kozawa, J. J. Santillan, and T. Itani
    Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator,:
    Appl. Phys. Express 5 (2012) 074301
  • S. Takei, A. Oshima, T. Wakabayashi, T. Kozawa, and S. Tagawa,
    Eco-friendly electron beam lithography using water-developable resist material derived from biomass
    Appl. Phys. Lett., 101 (2012) 033106
  • T. Kozawa,
    Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation
    Jpn. J. Appl. Phys., 51 (2012) 086504
  • T. Kozawa,
    Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
    J. Photopolym. Sci. Technol. 25 (2012) 625
  • H. Yamamoto, A. Ohnuma, T. Kozawa, and B. Ohtani,
    Location Control of Nanoparticles Using Combination of Top-down and Bottom-up Nano-fabrication
    J. Photopolym. Sci. Technol. 25 (2012) 449
  • H. Yamamoto, T. Kozawa, and S. Tagawa
    Dissolution Kinetics in Polymer-Bound and Polymer-Blended Photo-Acid Generators
    J. Photopolym. Sci. Technol. 25 (2012) 693
  • K. Okamoto, T. Kozawa, K. Oikawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohashi, R. Fujiyoshi, and T. Sumiyoshi
    Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser
    Appl. Phys. Express 5 (2012) 096701
  • T. Kozawa, J. J. Santillan, and T. Itani
    Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist
    Jpn. J. Appl. Phys. 51 (2012) 108002
  • T. Kozawa and A. Erdmann
    Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography, Jpn.
    J. Appl. Phys. 51 (2012) 106701
  • T. Kozawa
    Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists
    Jpn. J. Appl. Phys. 51 (2012) 116503
  • T. Kozawa
    Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists
    Jpn. J. Appl. Phys. 51 (2012) 126501
  • M. Fujikawa, K. Kobayashi, and T. Kozawa,
    Direct Oxidation of the [2Fe-2S] Cluster in SoxR Protein by Superoxide
    J. Biol. Chem. 287 (2012) 35702
  • K. Nakajima, K. Kitanishi, K. Kobayashi, N. Kobayashi, J. Igarashi, and T. Shimizu
    Leu65 in the heme distal side is critical for the stability of the Fe(II)-O2 complex of YddV, a globin-coupled oxygen sensor diguanylate cyclase
    J. Inorg. Biochem. 108 (2012) 163
  • S. Yamashita, G. Baldacchino, T. Maeyama, M. Taguchi, Y. Muroya, M. Lin, A. Kimura, T. Murakami, and Yosuke Katsumura
    Mechanism of radiation-induced reactions in aqueous solution of coumarin-3-carboxylic acid: Effects of concentration, gas and additive on fluorescent product yield
    Free Radic. Res., 46 (2012) 861
  • Y. Muroya, S. Sanguanmith, J. Meesungnoen, M. Lin, Y. Yan, Y. Katsumura, and J.-P. J.-G.
    Time-dependent yield of the hydrated electron in subcritical and supercritical water studied by ultrafast pulse radiolysis and Monte-Carlo Simulation
    Phys. Chem. Chem. Phys., 14 (2012) 14325
  • T. Fujiwara, T. Saito, Y. Muroya, H. Sawahata, Y. Yamashita, S. Nagasaki, K. Okamoto, H. Takahashi, M. Uesaka, Y. Katsumura, S. Tanaka
    Isotopic Ratio and Vertical Distribution of Radionuclides in Soil Affected by the Accident of Fukushima Dai-ichi Nuclear Power Plants
    J. Environ. Radioact, 113 (2012) 37
  • S. Sanguanmith, J. Meesungnoen, Y. Muroya, M. Lin, Y. Katsumura and J. -P. Jay-Gerin
    On the Spur Lifetime and Its Temperature Dependence in the Low Linear Energy Transfer Radiolysis of Water:
    Phys. Chem. Chem. Phys., 14 (2012) 16731
  • D. N. Tuan, H. Yamamoto, and S. Tagawa,
    Study on Resist Performance of Polymer-Bound and Polymer-Blended Photo-Acid Generators
    Jpn. J. Appl. Phys. (2012), 51,086503-1-086503-5
  • H. Fu, M. Lin, Y. Muroya, Y. Katsumura
    Pulse radiolysis studies of intermolecular charge transfer involving tryptophan and three-electron-bonded intermediates derived from methionine
    Res. Chem. Intermed., 38 (2012) 135
  • L. Wan, J. Peng, M. Lin, Y. Muroya, Y. Katsumura, H. Fu,
    Hydroxyl radical, sulfate radical and nitrate radical reactivity toward crown ethers in aqueous solutions
    Radiat. Phys. Chem., 81 (2012) 524
  • N. Taki, Y. Mizutani, T. Iwata, T. Kojima, H. Yamamoto, T. Kozawa,
    Ellipsometrical detection of optical trapped nanoparticles by periodically localized light
    Proc. of SPIE 8430, 84300Y-1-84300Y-8 (2012)
  • T. Kozawa, S. Tagawa, R. Ohnishi, T. Endo, and R. Sakamoto,
    Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation
    Jpn. J. Appl. Phys. 50 (2011) 016504.
  • T. Kozawa and A. Erdmann,
    Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography,
    Appl. Phys. Express 4 (2011) 026501
  • T. Kozawa, H. Yamamoto, and S. Tagawa,
    Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity
    Jpn. J. Appl. Phys. 50 (2011) 026502

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