2022 論文
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Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region
for chemically amplified extreme ultraviolet resists,
Takahiro Kozawa,
Jpn. J. Appl. Phys.(2022)61 016501.
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Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene)
film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution,
Yuko Tsutsui Ito and Takahiro Kozawa,
Jpn. J. Appl. Phys.(2022)61 016502.
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Photo- & radio-chromic iron-doped tungstic acids fabricated via submerged photosynthesis,
Shuntaro Murakami, Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Yuki Nakagawa, Tamaki Shibayama, Masato Ohnuma, Seiichi Watanabe,
Optical Materials(2022)124 111966.
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Fabrication of color-toned micro/nanopattern surface by submerged photosynthesis method,
Jumpei Tsukamura, Yuki Takahashi, Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Seiichi Watanabe,
Microelectronic Engineering(2022)256 111727.
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Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution,
Naoki Tanaka, Kyoko Matsuoka, Takahiro KOZAWA, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana,
Jpn. J. Appl. Phys.(2022)61 SD1016.
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Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation,
Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro KOZAWA,
Jpn. J. Appl. Phys.(2022)61 036503.
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Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning,
Yuqing Jin and Takahiro KOZAWA,
Jpn. J. Appl. Phys.(2022)61 056505.
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Effect of surface free energy of organic underlayer on dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer,
Tomoe Otsuka, Yuqing Jin, Naoki Tanaka, and Takahiro KOZAWA,
Jpn. J. Appl. Phys.(2022)61 056503.
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Interdomain Electron Transfer in Flavohemoglobin from Candida norvegensis with Antibiotic Azole Compounds,
Kazuo Kobayashi, Jotaro Igarashi, and Takahiro Kozawa,
FEBS Letters(2022)596 938-946.
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Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide,
Masahiko Harumoto, Julius Joseph Santillan, Toshiro Itani, and Takahiro Kozawa,
Jpn. J. Appl. Phys.(2022)61 056506.