古澤研究室
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2019 論文

  1. Effects of an organotin compound on radiation-induced reactions of extreme ultraviolet resists utilizing polarity change and radical crosslinking,
    S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 016504.

  2. Observation of dissociative quasifree electron attachment to nucleoside via excited anion radical in solution,
    Jun Ma, Anil Kumar, Yusa Muroya, Shinichi Yamashita, Tsuneaki Sakurai, Sergey A. Denisov, Michael D. Sevilla, Amitava Adhikary, Shu Seki, Mehran Mostafavi,
    Nat. Commun. 10 (2019) 102.

  3. Effects of molecular weight and dispersity on performance of main-chain-scission-type resist,
    Ayako Nakajima, Manabu Hoshino, Masakazu Hashimoto, and Takahiro Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 020909.

  4. Pulse Radiolysis Studies for Mechanism in Biochemical Redox Reactions,
    Kazuo Kobayashi,
    Chem. Rev. 119 (2019) 4413.

  5. Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer,
    T. Kozawa, A. Nakajima, T. Yamada, Y. Muroya, J. J. Santillan, and T. Itani,
    Jpn. J. Appl. Phys. 58 (2019) 036501.

  6. Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist,
    T. Yamada, S. Ishihara, Y. Muroya, J. J. Santillan, S. Yamashita, T. Itani, and T. Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 036503.

  7. Incorporation of chemical amplification in dual insolubilization resists,
    S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 056504.

  8. Proton transfer accompanied with oxidation reaction of adenosine,
    J. Choi, S. Tojo, D-S Ahn, M. Fujitsuka, S. Miyamoto, K. Kobayashi, H. Ihee, and T. Majima,
    Chem. Eur, J. 25 (2019) 7711.

  9. Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography,
    T. Kozawa, J. J. Santillan, and T. Itani,
    J. Photopolym. Sci. Technol. 32 (2019) 161-167.

  10. Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing,
    T. Kozawa and T. Tamura,
    Jpn. J. Appl. Phys. 58 (2019) 116503.

  11. Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography,
    T. Kozawa and T. Tamura,
    Jpn. J. Appl. Phys. 58 (2019) 076501.

  12. Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography,
    T. Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 096502.

  13. Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists,
    T. Yamada, Y. Muroya, S. Yamashita, Y. Komuro, D. Kawana, A. Yamazaki, and T. Kozawa,
    Jpn. J. Appl. Phys. 58 (2019) 096504.

  14. Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System,
    H. Kudo, M. Fukunaga, T. Yamada, S. Yamakawa, T. Watanabe, H. Yamamoto, K. Okamoto, and T. Kozawa,
    J. Photopolym. Sci. Technol. 32 (2019) 805-810.

  15. Fabrication of Iron Oxide Nanoparticles via Submerged Photosynthesis and the Morphologies under Different Light Sources,
    Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Seiichi Watanabe,
    ISIJ International/Volume 59 (2019) Issue 12 2352-2358.

  16. In vitro and in vivo anti-herpes simplex virus activity of monogalactosyl diacylglyceride from Coccomyxa sp. KJ (IPOD FERM BP-22254), a green microalga,
    Kyoko Hayashi,Jung-Bum Lee ,Kinya Atsumi,Mana Kanazashi,Tamaki Shibayama,Kazumasa Okamoto,Toshio Kawahara,Toshimitsu Hayashi,
    PLoS ONE 14(7)(2019): e0219305.