古澤研究室
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2020 論文

  1. Evidence for a critical dose above which damage to carbonate ester bonds in PADC appear after gamma ray and ultra soft X-ray exposures,
    T. Kusumoto, S. Okada, H. Kurashigec, K. Kobayashi, M. Fromm, Q. Raffy, N. Ludwig, M. Kanasakig, K. Oda, Y. Honda, S. Tojo, J.-E Groetz, R. Ogawara, S. Kodaira, R. Barillon, T. Yamauchi,
    Radiat. Phys. Chem. 170 (2020) 108628.

  2. Dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution,
    Ayako Nakajima, Kyoko Watanabe, Kyoko Matsuoka, Takahiro Kozawa, Yoshitaka Komuro, Daisuke Kawana and Akiyoshi Yamazaki,
    Jpn. J. Appl. Phys.(2020)59, 036505.

  3. Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography,
    Takahiro Kozawa and Takao Tamura,
    Jpn. J. Appl. Phys. 59 (2020)59, 016503.

  4. ESRから調べるDNAの放射線損傷機構,
    小林一雄,
    放射線化学 109(2020),P19-25.

  5. Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression,
    Kazuki Azumagawa and Takahiro KOZAWA,
    Jpn. J. Appl. Phys.(2020)59, 076501.

  6. Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments,
    Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa and Alex P. G. Robinson,
    Quantum Beam Sci. 2020, 4(2), 19.

  7. Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography,
    Naoki Maeda, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa and Takao Tamura,
    Jpn. J. Appl. Phys.(2020)59, 086501.

  8. Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists,
    Yuta Ikari, Kazumasa Okamoto, Akihiro Konda, Takahiro Kozawa and Takao Tamura,
    Jpn. J. Appl. Phys.(2020)59, 086506.

  9. Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes,
    Kazuki Azumagawa and Takahiro Kozawa,
    Jpn. J. Appl. Phys.(2020)59, 116505.

  10. Formation of intramolecular dimer radical ions of diphenyl sulfones,
    Kazumasa Okamoto, Shunpei Kawai & Takahiro Kozawa,
    Sci. Rep.(2020)10, 19823.

  11. Changes in molecular weight distribution caused by main-chain scission of electron beam resists,
    Takahiro Kozawa, Ayako Nakajima, and Manabu Hoshino,
    Jpn. J. Appl. Phys.(2020)59, 126506.

  12. Transient Absorption Spectroscopy of TlBr Crystals Using Pulsed Electron Beams,
    Masanori Koshimizu, Yusa Muroya, Shinichi Yamashita, Mitsuhiro Nogami, Keitaro Hitomi, Yutaka Fujimoto, and Keisuke Asai,
    Sensors and Materials, (2020)32, 4, 1445–1451.

  13. Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8),
    Hiroyuki Maekawa, Hiroto Kudo, Takeo Watanabe, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa,
    J. Photopolym. Sci.and Tech(2020)33, 45-51.