Nanofabrication Shop
Welcome to our homepage. (日本語/English)
The purpose of this workshop is the promotion of research by supporting micro/nanofabrication of various materials.
This workshop is available to all ISIR member free of charge.
Below figure shows our previous works.
Please point the cursor on photos and see details of contents. (Add-on must be permitted.)
Aluminum Chopper. Fabricated by use of photo lithography
and wet etching with acid.
Silver shaped mirrors on 24mm x 32mm slide glasses. They
became part of a special dark-field microscope ( Biophys. J. (2010), 98,
2014-2023 ).
Silicon thin film made from Si wafer. Si films under
200nm thick exist among the lattice architecture. Fabricated by photo lithography
and reactive ion etching.
Titanium electrodes and aluminum island among the electrodes.
Alternating electric field was applied to DNA molecule used by it
( Lab on a Chip, 2007, 7, 1738-1745 ).
Micro fluidic channels. The channel structure made from
poly dimethyl siloxane (PDMS) was shaped by molding method. PDMS and coverslip
were bonded by use of oxygen-plasma treatment. It was used in the evaluation
of multidrug efflux pump inhibitors ( PLoS ONE, 2011, 6, e18547 ).
Micro droplet array formed on 20μm circular patterns.
Utilizing hydrophilic/hydrophobic pattern fabricated by photo lithography and
reactive ion etching, directly accessible droplet array could be obtained. (
Lab on a Chip, 2010, 10, 3355-3362 ).
Silicon corn grating. Controlling gas pressure in reactive ion etching process,
the peaked structure could be obtained.
Silicon trench. Fabricated by electron beam lithography
and reactive ion etching.
Gold island structure. Fabricated by electron beam lithography and lift-off
process.
Please feel free to contact us if we can ever be of help to you.
Room number : S 314 (3rd floor in the second building)
Phone number :Ex 8433
E-mail : S. Sakakihara; shouichi@sanken