JP
Lab Info

Department of Beam Materials Science (Kozawa Lab.)

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# EUV # lithography # machine learning # nanofabrication materials

The Quantum Beam Materials Science Division studies chemical reactions and reaction fields, induced in materials by quantum beams under extreme conditions such as in the single-nanometer space region or in high-temperature, high-pressure and supercritical conditions, Using state-of-the-art quantum beams (electron beams, EUV, lasers, synchrotron radiation, X-rays, gamma rays, ion beams). We are elucidating chemical reaction systems from the application of energy to materials by quantum beams, through chemical reactions to the discovery of functions, constructing new chemical reaction systems based on the knowledge obtained and it will be useful for the development of materials and processes. In materials and process development, we conduct research and development of nanofabricated materials and processes for EUV lithography, which is used in the manufacture of cutting-edge semiconductor devices. In order to achieve carbon neutrality, it is essential to reduce the power required for digital information processing, which will continue to increase exponentially in the future, and nanofabrication technology is a key technology for manufacturing high-performance devices.

Staff

TAKAHIRO KOZAWA Professor
Research Map
Degree:
Ph.D in Engineering.
Career:
Apr.2010-Present Professor, Institute of Scientific and Industrial Research, Osaka University
Apr.2005-Mar.2010  Associate Professor, Institute of Scientific and Industrial Research, Osaka University
Apr.2002-Mar.2005 Associate Professor, Institute of Scientific and Industrial Research, Osaka University
Apr.1995-Mar.2002  Research Assistant, Institute of Scientific and Industrial Research, Osaka University
Oct.1992-Mar.1995  Research Assistant, Department of Quantum Science and Systems Engineering, Graduate School of Engineering, The University of Tokyo
Yusa Muroya Associate Professor Research Map
Kazumasa Okamoto Assistant Professor Research Map
We have elucidated the mechanism of line width fluctuation called line edge roughness, which is a problem in state-of-the-art semiconductor lithography.
We have elucidated the generation mechanism of stockastic defects, which is the biggest challenge in the development of next-generation lithography.

Current Research Topics

  • Analysis of resist images with pattern defects by Hough transform
    Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, & Yasushi Yagi, Jpn.J.Appl.Phys.62, 086502(2023), DOI 10.35848/1347-4065/acea0c
  • Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis
    Yui Takata, Yusa Muroya, Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, & Danilo De Simone, Jpn.J.Appl.Phys. 62, 076502 (2023), DOI:10.35848/1347-4065/ace012
  • Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process
    Takahiro Kozawa, Jpn.J.Appl.Phys. 62, 076501 (2023), DOI:10.35848/1347-4065/acde28
  • Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution
    Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu, Jpn. J. Appl. Phys. 62, 036503 (2023), DOI:10.35848/1347-4065/acc222
  • Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands,
    Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro Kozawa,Jpn. J. Appl. Phys. 61, 086508 (2022), DOI:10.35848/1347-4065/ac7dd3.
Lab Info

Department of Beam Materials Science (Kozawa Lab.)

website