Dynamics of radical cation of poly(4-hydroxystyrene)-type resist polymer, Kazumasa Okamoto, Yusa Muroya, Takahiro Kozawa, The 27th SANKEN International Symposium 2024
Application of machine learning to development of resist materials and lithography processes –image recognition, feature extraction, correlation analysis, and Bayesian optimization, Jin Yuqing, The 27th SANKEN International Symposium 2024 [学生発表] [invited]
Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, Kohei Hashimoto, Yui Takata, Yusa Muroya, Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, Danilo De Simone, 12th imec Handai International Symposium 2023 [学生発表]
Relationship between shot noise (stochasticity) and diffusion (smoothing) in resist processes for extreme ultraviolet lithography, Takahiro Kozawa, 36th International Microprocesses and Nanotechnology Conf. 2023 [invited]
Single Polymer Chain Negative Tone EUV Resist Utilizing Crosslinking by Radical Generation and Acid Amplification, Bilal A. Naqvi, Satoshi Enomoto, Kohei Machida, Yui Takata, Yusa Muroya, Takahiro Kozawa and Danilo De Simone, 36th International Microprocesses and Nanotechnology Conf. 2023
Study on Resist Performance of Inorganic-Organic Resist Materials for EUV and EB Lithography, Hiroki Yamamoto, Yuko Ito, Kazumasa Okamoto and Takahiro Kozawa, 36th International Microprocesses and Nanotechnology Conf. 2023
EUV Polymeric Resist with Various Functional Units, Bilal Abbas Naqvi, Yui Takata, Satoshi Enomoto, Danilo De Simone, Takahiro Kozawa, Stefan De Gendt, The 40th International Conference of Photopolymer Science and Technology 2023
Relationship between defect risks and effective reaction radius for deprotection in chemically amplified resist process for extreme ultraviolet lithography, Takahiro Kozawa, The 40th International Conference of Photopolymer Science and Technology [invited]
Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide, Hitomi Betsumiya, Yuko T. Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu, SPIE Advanced Lithography + Patterning 2023
Reaction mechanisms and patterning analysis of Sn-complex-side-chain polymer used for EUV lithography, Yui Takata, Yusa Muroya, Takahiro Kozawa, Satoshi Enomoto, Bilal Naqvi, Danilo De Simone, The Ionizing Radiation and Polymers symposium 2022 [学生発表]
Realtime analysis of pattern formation during the resist development process, Julius Joseph Santillan and Toshiro Itani, 35th International Microprocesses and Nanotechnology Conf. 2022
Photoresist stochastic defect generation depending on alkali-based developer’s alkyl chain length and concentration, Masahiko Harumoto , Andreia Figueiredo dos Santos , Julius Joseph Santillan , Toshiro Itani and Takahiro Kozawa , 35th International Microprocesses and Nanotechnology Conf. 2022 [学生発表]
Radiolysis of Water at Elevated Temperatures Relevant to Hydrogen Addition Technique: A Role of a Reaction between H-atom and a Water Molecule, Yusa Muroya, Symposium on Water Chemistry and Corrosion in Nuclear Power Plants in Asia, 2022（AWC2022）
Application of machine learning to development of chemically amplified resist materials and processes, Takahiro Kozawa, The 39th International Conference Photopolymer Science and Technology 2022 [invited]
Application of ethyltrimethylammonium hydroxide (ETMAH) developer for contact hole patterning in EUVL, Julius Joseph Santillan and Toshiro Itani, 34th International Microprocesses and Nanotechnology Conference2021
Decarboxylation and polymerization processes of metal resist ligands, T. Otsuka, Y. Muroya, T. Kozawa, T. Ikeda, Y. Komuro and D. Kawana, 34th International Microprocesses and Nanotechnology Conference2021 [学生発表]
The effects of tetramethyl ammonium hydroxide concentration on the dissolution of poly(4-hydroxystyrene), Naoki Tanaka, Kyoko Matsuoka, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana, 34th International Microprocesses and Nanotechnology Conference2021 [学生発表]
Effects of Resist-CrN Interaction on Resist Patterns of Chemically Amplified Resists Used for Electron Beam Lithography, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa and Takao Tamura, 34th International Microprocesses and Nanotechnology Conference2021 [学生発表]
Fabrication of ZnO/Si surface patterning bydefect control via Galvanic-submerged photo-synthesis of crystallities, Jumpei Tsukamura, Yuki Takahashi, Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Seiichi Watanabe, 34th International Microprocesses and Nanotechnology Conference2021
EUVL Stochastics Symposium, Takahiro Kozawa, 34th International Microprocesses and Nanotechnology Conference2021 [invited]
Study on beam-induced transient reaction process of carboxylic acids used as ligands of metal oxide nanocluster resists, Yusa Muroya, Kengo Ikeuchi, Tomoe Otsuka, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro Kozawa , 34th International Microprocesses and Nanotechnology Conference2021 [invited]
Stochastic effects in chemically amplified resists used for extreme ultraviolet lithography, Takahiro Kozawa, SPIE Photomask Technology + Extreme Ultraviolet Lithography 2021
Resist thickness dependence of latent images in chemically amplified resists used for electron beam lithography, Takahiro Kozawa and Takao Tamura, The 38th International Conference of Photopolymer Science and Technology [invited]
Development of negative-type molecular ion-resist materials using polarity change by EUV exposure , Kohei Fujisawa, Hiroyuki Maekawa, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa, The 38th International Conference of Photopolymer Science and Technology
Mechanism of electron beam resists, Takahiro Kozawa, The 27th Symposium on Photomask and Next Generation Lithography Mask Technology [invited]
Study on Primary Process of Beam-Induced Reaction of Metal Resist Ligands, Kengo Ikeuchi, Tomoe Otsuka, Yusa Muroya, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana, 33rd International Microprocesses and Nanotechnology Conference2020 [学生発表]
Effects of Resist Film Thickness on Line-and-Space Patterns of Chemically Amplified Resists Used for Electron Beam Lithography, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa and Takao Tamura, SPIE Photomask Technology + Extreme Ultraviolet Lithography 2020 [学生発表]
Gamma radiolysis study on solid nitrate calcines of reprocessing liquid waste for flexible nuclear waste management, Yusa Muroya, Akihiro Suzuki and Yoichi Endo, 8th Asia Pacific Symposium on Radiation Chemistry 2020
Thermal Effect in Chemically Amplified Resist Film Exposed to Electron Beam, Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa and T. Tamura, 32nd International Microprocesses and Nanotechnology Conference2019 [学生発表]
Pattern Formation Mechanisms of Metal Oxide Nanocluster EUV Resists, T. Kozawa, The 17th Fraunhofer IISB Lithography Simulation Workshop 2019
Improvement of Sensitivity of Chemically Amplified Resists by Adding Diphenyl Sulfone, S. Kawai , K. Okamoto , H. Yamamoto and T. Kozawa, 31st International Microprocesses and Nanotechnology Conference 2018 [学生発表]
Lamellar Orientation of PSPMMA Block Copolymer via Electron-Beam Induced Porlarity Switch in Nitrophenyl Selfassembled monolayer (SAM), H. Yamamoto, G. Dawson, T. Kozawa, 31st International Microprocesses and Nanotechnology Conference 2018 [invited]
Stochasticity in EUV lithography, T. Kozawa, J.J.Santillan, T. Itani, 16th FRAUNHOFER IISB 2018 [invited]
Potential cause of inhomogeneous acid distribution H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano, Digest of Papers - Microprocesses and Nanotechnology 2004 236-237 2004年12月1日
High-duty 1.6 cell s-band RF gun driven by a psec Nd:YAG laser Y. Aoki, J. Yang, M. Yorozu, Y. Okada, A. Endo, T. Kozawa, Y. Yoshida, S. Tagawa, M. Washio, X. Wang, I. Ben-Zvi, Proceedings of the IEEE Particle Accelerator Conference 3 2018-2020 1999年12月1日
