JIN Yuqing (D2)、古澤孝弘 EUV TECH 2nd Place Best Student Presentation Award, Photomask Tecnology + EUV Lithography Automatic evaluation of line-and-space resist patterns with defects using image recognition technology, Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, Yasushi Yagi. November 2023
岡本一将、井狩優太(M2)、誉田明宏、古澤孝弘 一般社団法人日本原子力学会 2021年度 加速器・ビーム科学部会賞学術賞 日本原子力学会加速器・ビーム科学部会 Dependence of dose rate on the sensitivity of the resist under ultra–high flux extreme ultraviolet (EUV) pulse irradiation, Kazumasa Okamoto, Shunpei Kawai , Yuta Ikari , Shigeo Hori, Akihiro Konda, Koki Ueno, Yohei Arai, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Akira Kon, Shigeki Owada, Yuichi Inubushi, Hiroo Kinoshita and Takahiro Kozawa, Applied Physics Express(2021)14 066502. 2022年3月
東川一希 (M2)、古澤孝弘 Outstanding Paper Award at MNC 2020 from JJAP Special Issue, 33rd International Microprocesses and Nanotechnology Conference Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography, Kazuki Azumagawa and Takahiro Kozawa. November 2021
井狩優太(M2)、岡本一将、前田尚輝(M2)、誉田明宏、古澤孝弘 2020 Hiroshi Ito Student Award, SPIE Advanced Lithography Mechanism of resist heating effect in chemically amplified resist, Yuta Ikari, Kazumasa Okamoto, Naoki Maeda, Akihiro Konda, Takahiro Kozawa, Takao Tamura. February 2021
榎本智至、古澤孝弘 Best Poster Award, Photomask Technology Study of RLS trade-off mitigation utilizing a novel negative chemically amplified resist for high resolution patterning, Satoshi Enomoto, Kohei Machida, Michiya Naito, Takahiro Kozawa. September 2019
仮屋深央(M2) The Excellent Poster Award, Chair of the Organizing Committee APSRC-2018 November 2018
古澤孝弘、山本洋輝 DPS2016 Best Presentation Award, 39th International Symposium on Dry Process(DPS2016) Oblique pattern etching with CIF3-Ar neutral cluster beam, T. Seki, T. Aoki, J. Matsuo (Kyoto University),H. Yamamoto, T. Kozawa (Osaka University),T. Shojo, K. Koike (Iwatani Corp.) . November 2017
誉田明宏 (D2)、山本洋輝、古澤孝弘 MNC 2016 Most Impressive Poster, 29th International Microprocesses and Nanotechnology Conference Dependence of Dissolution Kinetics of ZEP 520A on Change of Molecular Weight Induced by Electron Beam Irradiation, Akihiro Konda, Hiroki Yamamoto, Takahiro Kozawa, and Shusuke Yoshitake. November 2017
誉田明宏 (D2)、山本洋輝、古澤孝弘 Finalist of the 2016 Photronics sponsored Best Student Paper Award, SPIE(The International Society for Optical Engineering) Dependence of Dissolution Behavior of Main-Chain Scission Type Resists on Molecular Weight, Akihiro Konda, Hiroki Yamamoto, Takahiro Kozawa and Shusuke Yoshitake. September 2017
