1. Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Laser Lithography System (vol 31, pg 221, 2018)
    Hiroto Kudo, Shizuya Ohori, Hiroya Takeda, Hiroki Ogawa, Takeo Watanabe, Hiroki Yamamoto, Takahiro Kozawa, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 31(6) 759-759 2018年  
  2. Deprotonation mechanism of ionized poly(4-hydroxystyrene)
    Toshihiko Susa, Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo. Umegaki, ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI 9051 2014年  
  3. Fluidity dependence of deprotonation kinetics of chemically amplified resist
    Kazumasa Okamoto, Takuya Ishida, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo. Umegaki, ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXI 9051 2014年  
  4. Dynamics of Radical Ions of Fluorinated Polymer for Extreme Ultraviolet (EUV) Lithography
    Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki, PHOTOMASK JAPAN 2015: PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXII 9658 2015年  
  5. Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist
    Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa, ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2 6923 2008年  
  6. Acid-base equilibrium in chemically amplified resist
    Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2 6923 69231A/1-69231A/8 2008年  
  7. Dynamics of poly(4-hydroxystyrene) radical cation
    Kazumasa Okamoto, Takahiro Kozawa, Seiichi Tagawa, ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2 6923 692329/1-692329/8 2008年  
  8. Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron Beam
    Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa, ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2 7639 76391K/1-76391K/9 2010年  
  9. The reaction mechanism of poly [4-hydroxystyrene-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)-styrene]
    Hiroki Yamamoto, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, Tomoyuki Ando, Mitsuru Sato, Hiroji Komano, ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2 6153 U1390-U1398 2006年  
  10. Nanoscale reaction analysis of resist materials for nanolithography
    Takahiro Kozawa, Akinori Saeki, Kazumasa Okamoto, Seiichi Tagawa, 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings 283-286 2005年12月1日  
  11. Dependence of acid yield on resist thickness in chemically amplified electron beam resist
    T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference 2005 112-113 2005年12月1日  
  12. Potential cause of inhomogeneous acid distribution
    H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano, Digest of Papers - Microprocesses and Nanotechnology 2004 236-237 2004年12月1日  
  13. Dependence of acid yield on acid generator in chemically amplified resist for post-optical lithography
    A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto, Digest of Papers - Microprocesses and Nanotechnology 2004 232-233 2004年12月1日  
  14. Deprotonation mechanism of poly(4-hydroxystyrene) and its derivative
    Atsuro Nakano, Kazumasa Okamoto, Yukio Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Hiroaki Nemoto, Tsutomu Shimokawa, Progress in Biomedical Optics and Imaging - Proceedings of SPIE 5753(II) 1034-1039 2005年  
  15. Studies on the possibility of highly sensitive PMMA based chemically amplified resists for EB and X-ray lithography
    A Nakano, K Okamoto, T Kozawa, S Tagawa, MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS 236-237 2001年  
  16. Polymer screening method for chemically amplified electron beam and X-ray resists
    H. Yamamoto, A. Nakano, K. Okamoto, T. Kozawa, S. TagawaDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 70-71 2003年  
  17. Effects of ester groups on proton generation and diffusion in polymethacrylate matrices
    A. Nakano, K. Okamoto, T. Kozawa, S. TagawaDigest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 120-121 2003年 
  18. High-duty 1.6 cell s-band RF gun driven by a psec Nd:YAG laser
    Y. Aoki, J. Yang, M. Yorozu, Y. Okada, A. Endo, T. Kozawa, Y. Yoshida, S. Tagawa, M. Washio, X. Wang, I. Ben-Zvi, Proceedings of the IEEE Particle Accelerator Conference 3 2018-2020 1999年12月1日  
  19. Pulse radiolysis and laser flash photolysis studies on EB, X-ray and ArF resists.
    S Tagawa, T Tanaka, S Tsuji, S Nagahara, T Kozawa, Y Yoshida, ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 214 120-PMSE 1997年9月
  20. MECHANISMS OF ACID GENERATION IN HIGH SENSITIVE ELECTRON-BEAM RESIST SYSTEMS
    S TAGAWA, Y YOSHIDA, T KOZAWA, M UESAKA, K MIYA, ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY 203 93-PMSE 1992年4月