Application of machine learning to development of resist materials and lithography processes –image recognition, feature extraction, correlation analysis, and Bayesian optimization, Jin Yuqing, The 27th SANKEN International Symposium 2024
Relationship between shot noise (stochasticity) and diffusion (smoothing) in resist processes for extreme ultraviolet lithography, Takahiro Kozawa, 36th International Microprocesses and Nanotechnology Conf. 2023
Relationship between defect risks and effective reaction radius for deprotection in chemically amplified resist process for extreme ultraviolet lithography, Takahiro Kozawa, The 40th International Conference of Photopolymer Science and Technology 2023
Application of machine learning to development of chemically amplified resist materials and processes, Takahiro Kozawa, The 39th International Conference Photopolymer Science and Technology 2022
EUVL Stochastics Symposium, Takahiro Kozawa, 34th International Microprocesses and Nanotechnology Conference2021
Study on beam-induced transient reaction process of carboxylic acids used as ligands of metal oxide nanocluster resists, Yusa Muroya, Kengo Ikeuchi, Tomoe Otsuka, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro Kozawa , 34th International Microprocesses and Nanotechnology Conference 2021
Resist thickness dependence of latent images in chemically amplified resists used for electron beam lithography, Takahiro Kozawa and Takao Tamura, The 38th International Conference of Photopolymer Science and Technology 2021
Mechanism of electron beam resists, Takahiro Kozawa, The 27th Symposium on Photomask and Next Generation Lithography Mask Technology 2021
Lamellar Orientation of PSPMMA Block Copolymer via Electron-Beam Induced Porlarity Switch in Nitrophenyl Selfassembled monolayer (SAM), H. Yamamoto, G. Dawson, T. Kozawa, 31st International Microprocesses and Nanotechnology Conference 2018
Stochasticity in EUV lithography, T. Kozawa, J.J.Santillan, T. Itani, 16th FRAUNHOFER IISB 2018