2024
2023
2022
2021
2020
2019
2018
2017
2016
2015
2014
2013
2012
2011
2010

2024

  1. Safia Tabassum , Yosuke Katsumur, Yusa Muroya , Hasan M. Khan, Abdul Naeem Khan, Sabiha Sultana, Kuniki Hata , Reaction of mono- and dichlorophenols with •OH and hydrated electrons: A pulse radiolysis study, Radiation Physics and Chemistry(2024)218 111614. DOI 10.1016/j.radphyschem.2024.111614
  2. Tetsuo Fukasawa, Akihiro Suzuki, Yoichi Endo, Yaohiro Inagaki, Tatsumi Arima, Yusa Muroya, Keita Endo, Daisuke Watanabe, Tatsuro Matsumura, Katsunori Ishii and Junichi Yamashita, Flexible waste management system for the future application of MA P&T technology to the current high-level liquid waste, Journal of Nuclear Science and Technology(2024)61 307-317. DOI 10.1080/00223131.2023.2226673
  3. Masanori Koshimizu, Yusa Muroya, Mitsuhiro Nogami, and Keitaro Hitomi, Recombination Dynamics of Electron–Hole Pairs in TlBr Crystals Probed by Transient Absorption Spectroscopy Using Pulsed Electron Beams, Sensors and Materials(2024)36 261-267. DOI 10.18494/SAM4694
  4. Yuko Tsutsui Ito, Kyoko Watanabe, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu, Dissolution dynamics of poly(4-hydroxystyrene) in potassium hydroxide (KOH) and sodium hydroxide (NaOH) aqueous solutions investigated by quartz crystal microbalance (QCM) method, Jpn. J. Appl. Phys.(2024) 63 046502. DOI 10.35848/1347-4065/ad3373
  5. Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu, Dissolution dynamics of zirconia nanocluster resist, Jpn. J. Appl. Phys.(2024) 63  046501. DOI 10.35848/1347-4065/ad313f
  6. Bilal A. Naqvi, Satoshi Enomoto, Kohei Machida, Yui Takata, Takahiro Kozawa, Yusa Muroya, Stefan De Gendt, and Danilo De Simone, Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking, Chem. Mater.(2024)36 1459–1471. DOI 10.1021/acs.chemmater.3c02628
  7. Yutaro Iwashige, Kyoko Watanabe, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, and Makoto Muramatsu, Dissolution dynamics of poly(4-hydroxystyrene-co-methacrylic acid) in tetraalkylammonium hydroxide aqueous solutions, Jpn. J. Appl. Phys.(2024) 63 026504. DOI 10.35848/1347-4065/ad2302
  8. Yuko Tsutsui Ito, Kyoko Watanabe, Yuqing Jin, Takahiro Kozawa, Kazuo Sakamoto and Makoto Muramatsu, Relationship between poly(4-hydroxystyrene) (PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH aqueous solution studied by a quartz crystal microbalance (QCM) method, Jpn. J. Appl. Phys.(2024) 63 018002. DOI 10.35848/1347-4065/ad17dd
  9. Takahiro Kozawa, Shielding effect of underlayer against secondary electrons generated in substrate in extreme ultraviolet lithography, Jpn. J. Appl. Phys.(2024) 63 016503. DOI 10.35848/1347-4065/ad10ee

2023

  1. Hiroyuki Maekawa, Yutaro Iwashige, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa ,and Hiroto Kudo, Design of High-Sensitive EUV Resist Materials based on Polyacetals, Journal of Photopolymer Science and Technology(2023)36 31-39.DOI10.2494/photopolymer.36.31
  2. Hanqin Weng, Yi Wang, Fuhai Li e, Yusa Muroya, Shinichi Yamashita, Sheng Cheng, Recovery of platinum group metal resources from high-level radioactive liquid wastes by non-contact photoreduction, Journal of Hazardous Materials(2023)458 131852. DOI 10.1016/j.jhazmat.2023.131852
  3. Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani and Takahiro Kozawa, Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer, Jpn.J.Appl.Phys.(2023)62 SG1037. DOI 10.35848/1347-4065/acbcdc
  4. Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa and Masamichi Nishimura, Sensitization of polymethacrylate resist with adding acid-generating promoters upon exposure to EUV light, Jpn.J.Appl.Phys, 62,116503 (2023). DOI 10.35848/1347-4065/ad0745
  5. Takahiro Kozawa, Effects of underlayer absorption coefficient on bridging risk in chemically amplified resist process for extreme ultraviolet lithography, Jpn.J.Appl.Phys.(2023) 62 116502. DOI 10.35848/1347-4065/ad05ff
  6. Yuqing Jin, Takahiro Kozawa, Kota Aoki, Tomoya Nakamura, Yasushi Makihara, & Yasushi Yagi, Analysis of resist images with pattern defects by Hough transform. Jpn.J.Appl.Phys.(2023)62, 086502. DOI 10.35848/1347-4065/acea0c
  7. Yui Takata, Yusa Muroya, Takahiro Kozawa, Kohei Machida, Satoshi Enomoto, Bilal Naqvi, & Danilo De Simone, Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis. Jpn.J.Appl.Phys.(2023)62 076502. DOI:10.35848/1347-4065/ace012
  8. Takahiro Kozawa, Defect risks at interfaces of chemically amplified resists in extreme ultraviolet lithography process, Jpn.J.Appl.Phys.(2023)62 076501. DOI:10.35848/1347-4065/acde28
  9. Kazuo Kobayashi, Yuko Tsutsui Ito, Yuri Kasu, Masaki Horitani, Takahiro Kozawa, Intramolecular electron transfer from biopterin to FeII-O2 complex in nitric oxide synthases occurs at very different rates between bacterial and mammalian enzymes: Direct observation of a catalytically active intermediate, Journal of Inorganic Biochemistry (2023)238 112035. https://doi.org/10.1016/j.jinorgbio.2022.112035
  10. Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani and Takahiro Kozawa, Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography, Jpn. J. Appl. Phys.(2023)62 016503. DOI 10.35848/1347-4065/aca9ae
  11. Takahiro Kozawa, Protected unit distribution near interfaces of chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys.(2023)62 016509. DOI 10.35848/1347-4065/acb0b2
  12. Peng Zhang, Yizhi Chen, Hanqin Weng, Yusa Muroya, Shinichi Yamashita, Yinhua Zhao and Mingzhang Lin, Reduced graphene oxide composite aerogel prepared by europium-assisting radiation reduction as a broad-spectrum adsorbent for organic pollutants, J. Mater. Chem. A (2023)11 2804-2813. https://doi.org/10.1039/D2TA08576C
  13. J. G. G. Ndongo Assomo, S. Ebrahimi, Y. Muroya, J.-P. Jay-Gerin & A. Soldera, Molecular Dynamics Simulation Reveals a Change in the Structure of Liquid Water Near 150 °C, which May Explain Apparent Anomalies in High-Temperature Water Radiolysis, Chemistry Africa (2023)6 375?381. https://doi.org/10.1007/s42250-022-00513-2
  14. Yutaro Iwashige, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto, Makoto Muramatsu, Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions, Jpn. J. Appl. Phys.(2023)62 036502. DOI 10.35848/1347-4065/acbcb6
  15. Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani and Takahiro Kozawa, Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer, Jpn. J. Appl. Phys.(2023)62 SG1037. DOI 10.35848/1347-4065/acbcdc
  16. Hitomi Betsumiya, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto and Makoto Muramatsu, Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution, Jpn. J. Appl. Phys.(2023)62 036503. DOI 10.35848/1347-4065/acc222
  17. Hitomi Betsumiya, Yuqing Jin, Yuko Tsutsui Ito, Takahiro Kozawa, Kazuo Sakamoto and Makoto Muramatsu, Classification of dissolution modes of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions, Jpn. J. Appl. Phys.(2023)62 066501. DOI 10.35848/1347-4065/acd59c

2022

  1. Takahiro Kozawa, Formulation of trade-off relationships between resolution, line edge roughness, and sensitivity in sub-10 nm half-pitch region for chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys.(2022)61 016501. DOI 10.35848/1347-4065/ac3ea7
  2. Yuko Tsutsui Ito and Takahiro Kozawa, Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution, Jpn. J. Appl. Phys.(2022)61 016502. DOI 10.35848/1347-4065/ac3d42
  3. Shuntaro Murakami, Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Yuki Nakagawa, Tamaki Shibayama, Masato Ohnuma, Seiichi Watanabe, Photo- & radio-chromic iron-doped tungstic acids fabricated via submerged photosynthesis, Optical Materials(2022)124 111966. https://doi.org/10.1016/j.optmat.2021.111966
  4. Jumpei Tsukamura, Yuki Takahashi, Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Seiichi Watanabe, Fabrication of color-toned micro/nanopattern surface by submerged photosynthesis method, Microelectronic Engineering(2022)256 111727. https://doi.org/10.1016/j.mee.2022.111727
  5. Naoki Tanaka, Kyoko Matsuoka, Takahiro KOZAWA, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana, Effects of film thickness and alkaline concentration on dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution, Jpn. J. Appl. Phys.(2022)61 SD1016. DOI 10.35848/1347-4065/ac4b08
  6. Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro KOZAWA, Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation, Jpn. J. Appl. Phys.(2022)61 036503. DOI 10.35848/1347-4065/ac4b43
  7. Yuqing Jin and Takahiro KOZAWA, Classification of lines, spaces, and edges of resist patterns in scanning electron microscopy images using unsupervised machine learning, Jpn. J. Appl. Phys.(2022)61 056505. DOI 10.35848/1347-4065/ac56b5
  8. Tomoe Otsuka, Yuqing Jin, Naoki Tanaka, and Takahiro KOZAWA, Effect of surface free energy of organic underlayer on dissolution kinetics of poly(4-hydroxystyrene) film in tetramethylammonium hydroxide aqueous developer, Jpn. J. Appl. Phys.(2022)61 056503. DOI 10.35848/1347-4065/ac5947
  9. Kazuo Kobayashi, Jotaro Igarashi, and Takahiro Kozawa, Interdomain Electron Transfer in Flavohemoglobin from Candida norvegensis with Antibiotic Azole Compounds, FEBS Letters(2022)596 938-946. https://doi.org/10.1002/1873-3468.14327
  10. Masahiko Harumoto, Julius Joseph Santillan, Toshiro Itani, and Takahiro Kozawa, Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide, Jpn. J. Appl. Phys.(2022)61 056506. DOI 10.35848/1347-4065/ac61f2
  11. Yuqing Jin and Takahiro Kozawa, Estimation of effective reaction radius for catalytic chain reaction of chemically amplified resist by Bayesian optimization, Jpn. J. Appl. Phys. (2022)61 066504. DOI 10.35848/1347-4065/ac6a36
  12. Yuko Tsutsui Ito, Hitomi Betsumiya, Takahiro Kozawa, Kazuo Sakamoto and Makoto Muramatsu, Swelling and dissolution kinetics of poly(4-hydroxystyrene) in tetrabutylammonium hydroxide (TBAH) aqueous solutions studied by quartz crystal microbalance (QCM) method—in comparison with tetramethylammonium hydroxide (TMAH) aqueous solutions, Jpn. J. Appl. Phys. (2022)61 066506. DOI 10.35848/1347-4065/ac6c11
  13. Kazumasa Okamoto, Akihiro Konda, Yuki Ishimaru, Takahiro Kozawa, Yasunobu Nakagawa and Masamichi Nishimura, Study on deprotonation from radiation-induced ionized acrylate polymers including acid-generation promoters for improving chemically amplified resists, Jpn. J. Appl. Phys. (2022)61 066505. DOI 10.35848/1347-4065/ac67ba
  14. Yoshiyuki Murakami, Ryosuke Nishikubo, Fumitaka Ishiwari, Kazumasa Okamoto, Takahiro Kozawac and Akinori Saeki, Exploration of charge transport materials to improve the radiation tolerance of lead halide perovskite solar cells†, Mater. Adv. (2022)3 4861-4869. https://doi.org/10.1039/D2MA00385F
  15. Tomoe Otsuka, Yusa Muroya, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro Kozawa, Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands, Jpn. J. Appl. Phys. (2022)61 086508. DOI 10.35848/1347-4065/ac7dd3
  16. Naoki Tanaka, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana, Electrostatic effect on the dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution, Jpn. J. Appl. Phys. (2022)61 086509. DOI 10.35848/1347-4065/ac8034
  17. Takahiro Kozawa, Theoretical study on defect risks of chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. (2022)61 106502. DOI 10.35848/1347-4065/ac8dd1
  18. Takahiro Kozawa, Interfacial effects on sensitization of chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. (2022)61 116501. DOI 10.35848/1347-4065/ac9500
  19. Akihiro Konda, Hiroki Yamamoto, Shusuke Yoshitake, Takahiro Kozawa, Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight, J. Photopolym. Sci. Technol. (2022)35 1-7. https://doi.org/10.2494/photopolymer.35.1
  20. Yutaro Iwashige, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa, Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet(EUV) Exposure Tool, J. Photopolym. Sci. Technol. (2022)35 41-47.  https://doi.org/10.2494/photopolymer.35.41

2021

  1. Ayako Nakajima, Manabu Hoshino and Takahiro Kozawa, Gel permeation chromatography analysis of remaining components of electron-beam-irradiated ZEP520A resist after development, Jpn. J. Appl. Phys. (2021)60, 010901. DOI 10.35848/1347-4065/abcf07
  2. Ayako Nakajima, Keiko Matsuo and Takahiro Kozawa, Dissolution kinetics of main-chain-scission-type resist in organic developers, Appl. Phys. Express(2021)14 026501. DOI 10.35848/1882-0786/abd71b
  3. Kazuo Kobayashi, JeeEun Kim, Yohta Fukuda, Takahiro Kozawa, Tsuyoshi Inoue, Fast Autooxidation of a Bis-Histidyl–Ligated Globin from the Anhydrobiotic Tardigrade, Ramazzottius varieornatus, by Molecular Oxygen, J. Biochem.(2021)169, 663-673. https://doi.org/10.1093/jb/mvab003
  4. Toshinori Oozeki, Tadashi Nakai, Kazuki Kozakai, Kazuki Okamoto, Shun’ichi Kuroda, Kazuo Kobayashi, Katsuyuki Tanizawa and Toshihide Okajima, Functional and structural characterization of a flavoprotein monooxygenase essential for biogenesis of tryptophylquinone cofactor, Nat Commun(2021)12 933. DOI https://doi.org/10.1038/s41467-021-21200-9
  5. Kazuki Azumagawa and Takahiro Kozawa, Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys.(2021)60, SCCC02. DOI 10.35848/1347-4065/abe802
  6. Masahiko Harumoto, Tomohiro Motono, Andreia Figueiredo dos Santos, Chisayo Mori, Yuji Tanaka, Harold Stokes, Masaya Asai, Julius Joseph Santillan, Toshiro Itani and Takahiro Kozawa, Pattern collapse mitigation by controlling atmosphere during development process for semiconductor lithography, Jpn. J. Appl. Phys.(2021)60, SCCA03. DOI 10.35848/1347-4065/abe7c2
  7. Kazumasa Okamoto and Takahiro Kozawa, Estimation of electron affinity of photoacid generators: density functional theory calculations using static and dynamic models, Jpn. J. Appl. Phys.(2021)60, SCCC03. DOI 10.35848/1347-4065/abf469
  8. Ayako Nakajima, Manabu Hoshino and Takahiro Kozawa, Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists, Jpn. J. Appl. Phys.(2021)60, 056501. DOI 10.35848/1347-4065/abf49f
  9. Kazumasa Okamoto, Shunpei Kawa, Yuta Ikari, Shigeo Hori, Akihiro Konda, Koki Ueno, Yohei Arai, Masahiko Ishino, Thanh-Hung Dinh, Masaharu Nishikino, Akira Kon, Shigeki Owada, Yuichi Inubushi, Hiroo Kinoshita and Takahiro Kozawa, Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation, Applied Physics Express(2021)14, 066502. DOI 10.35848/1882-0786/abfca3
  10. Naoki Tanaka, Kyoko Watanabe, Kyoko Matsuoka, Kazuki Azumagawa, Takahiro Kozawa, Takuya Ikeda, Yoshitaka Komuro and Daisuke Kawana, Analysis of dissolution kinetics of narrow polydispersity poly(4-hydroxystyrene) in alkaline aqueous solution using machine learning, Jpn. J. Appl. Phys.(2021)60, 066503. DOI 10.35848/1347-4065/ac016d
  11. Yoshiyuki Murakami, Fumitaka Ishiwari, Kazumasa Okamoto, Takahiro Kozawa and Akinori Saeki, Electron Beam Irradiation of Lead Halide Perovskite Solar Cells: Dedoping of Organic Hole Transport Materials despite Hardness of the Perovskite Layer, ACS Applied Materials & Interfaces (2021)13, 24824-24832. https://doi.org/10.1021/acsami.1c04439
  12. K. Ikeuchi, Y. Muroya, T. Ikeda, Y. Komuro, Study on radical dianions of carboxylates used as ligands of metal oxide nanocluster resists, Jpn. J. Appl. Phys.(2021)60 076503. DOI 10.35848/1347-4065/ac06db
  13. Takahiro Kozawa and Takao Tamura, Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography, J. Photopolym. Sci. Technol.(2021)34 17-25. DOI https://doi.org/10.2494/photopolymer.34.17
  14. K. Fujisawa, H. Maekawa, H. Kudo, K. Okamoto, and T. Kozawa, Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure, J. Photopolym. Sci. Technol.(2021)34 87-93. DOI https://doi.org/10.2494/photopolymer.34.87
  15. Yuqing Jin, Takahiro Kozawa and Takao Tamura, Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning, Jpn. J. Appl. Phys.(2021)60 076509. DOI 10.35848/1347-4065/ac0d13
  16. Takahiro Kozawa and Takao Tamura, Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication, Jpn. J. Appl. Phys.(2021)60 086503. DOI 10.35848/1347-4065/ac1644
  17. Sunuchakan Sanguanmith, Jintana Meesungnoen, Yusa Muroya, and Jean-Paul Jay-Gerin, Scavenging of "dry" electrons prior to hydration by azide ions: Effect on the formation of H2 in the radiolysis of water by 60Co γ-rays and tritium β-electrons., Can. J. Chem.(2021)99 881-889. https://doi.org/10.1139/cjc-2020-0504
  18. Yi Wang, Jialiang Chen, Lan Wang, Hanqin Weng, Zhihao Wu, Limin Jiao. Yusa Muroya, Shinichi Yamashita, Sheng Cheng, Fuhai Li, Hongbing Chen, Wei Huang and Mingzhang Lin, γ-Radiation synthesis of ultrasmall noble metal (Pd, Au, Pt) nanoparticles embedded on boron nitride nanosheets for high-performance catalysis, Ceramics International(2021)47 26963-26970. https://doi.org/10.1016/j.ceramint.2021.05.327
  19. Takahiro Kozawa and Takao Tamura, Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication, Jpn. J. Appl. Phys.(2021)60 126504. DOI 10.35848/1347-4065/ac33cd

2020

  1. T. Kusumoto, S. Okada, H. Kurashigec, K. Kobayashi, M. Fromm, Q. Raffy, N. Ludwig, M. Kanasakig, K. Oda, Y. Honda, S. Tojo, J.-E Groetz, R. Ogawara, S. Kodaira, R. Barillon, T. Yamauchi, Evidence for a critical dose above which damage to carbonate ester bonds in PADC appear after gamma ray and ultra soft X-ray exposures, Radiat. Phys. Chem. 170 (2020) 108628. https://doi.org/10.1016/j.radphyschem.2019.108628
  2. Ayako Nakajima, Kyoko Watanabe, Kyoko Matsuoka, Takahiro Kozawa, Yoshitaka Komuro, Daisuke Kawana and Akiyoshi Yamazaki, Dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution, Jpn. J. Appl. Phys.(2020)59, 036505. DOI 10.35848/1347-4065/ab7721
  3. Takahiro Kozawa and Takao Tamura, Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography, Jpn. J. Appl. Phys. 59 (2020)59, 016503. DOI 10.7567/1347-4065/ab5d6a
  4. 小林一雄, ＥＳＲから調べるＤＮＡの放射線損傷機構,放射線化学 109(2020),P19-25.
  5. Kazuki Azumagawa and Takahiro KOZAWA, Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression, Jpn. J. Appl. Phys.(2020)59, 076501. DOI 10.35848/1347-4065/ab984e
  6. Hiroki Yamamoto, Guy Dawson, Takahiro Kozawa and Alex P. G. Robinson, Lamellar Orientation of a Block Copolymer via an Electron-Beam Induced Polarity Switch in a Nitrophenyl Self-Assembled Monolayer or Si Etching Treatments, Quantum Beam Sci. 2020, 4(2), 19. https://doi.org/10.3390/qubs4020019
  7. Naoki Maeda, Akihiro Konda, Kazumasa Okamoto, Takahiro Kozawa and Takao Tamura, Resist thickness dependence of line width roughness of chemically amplified resists used for electron beam lithography, Jpn. J. Appl. Phys.(2020)59, 086501. DOI 10.35848/1347-4065/ab9fde
  8. Yuta Ikari, Kazumasa Okamoto, Akihiro Konda, Takahiro Kozawa and Takao Tamura, Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists, Jpn. J. Appl. Phys.(2020)59, 086506. DOI 10.35848/1347-4065/aba7d7
  9. Kazuki Azumagawa and Takahiro Kozawa, Regression analysis of photodecomposable quencher concentration effects on chemical gradient in chemically amplified extreme ultraviolet resist processes, Jpn. J. Appl. Phys.(2020)59, 116505. DOI 10.35848/1347-4065/abc29d
  10. Kazumasa Okamoto, Shunpei Kawai & Takahiro Kozawa, Formation of intramolecular dimer radical ions of diphenyl sulfones, Sci. Rep.(2020)10, 19823. https://doi.org/10.1038/s41598-020-76907-4
  11. Takahiro Kozawa, Ayako Nakajima, and Manabu Hoshino, Changes in molecular weight distribution caused by main-chain scission of electron beam resists, Jpn. J. Appl. Phys.(2020)59, 126506. DOI 10.35848/1347-4065/abcc12
  12. Masanori Koshimizu, Yusa Muroya, Shinichi Yamashita, Mitsuhiro Nogami, Keitaro Hitomi, Yutaka Fujimoto, and Keisuke Asai, Transient Absorption Spectroscopy of TlBr Crystals Using Pulsed Electron Beams, Sensors and Materials, (2020)32, 4, 1445–1451. https://doi.org/10.18494/SAM.2020.2754
  13. Hiroyuki Maekawa, Hiroto Kudo, Takeo Watanabe, Hiroki Yamamoto, Kazumasa Okamoto, Takahiro Kozawa, Higher Sensitive Extreme Ultraviolet (EUV) Resist Materials Derived From p-t-Butylcalix[n]arenes (n = 4 and 8), J. Photopolym. Sci.and Tech(2020)33, 45-51. https://doi.org/10.2494/photopolymer.33.45

2019

  1. S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa, Effects of an organotin compound on radiation-induced reactions of extreme ultraviolet resists utilizing polarity change and radical crosslinking, Jpn. J. Appl. Phys. 58 (2019) 016504. DOI 10.7567/1347-4065/aae986
  2. Jun Ma, Anil Kumar, Yusa Muroya, Shinichi Yamashita, Tsuneaki Sakurai, Sergey A. Denisov, Michael D. Sevilla, Amitava Adhikary, Shu Seki, Mehran Mostafavi, Observation of dissociative quasifree electron attachment to nucleoside via excited anion radical in solution, Nat. Commun. 10 (2019) 102. https://doi.org/10.1038/s41467-018-08005-z https://www.nature.com/articles/s41467-018-08005-z
  3. Ayako Nakajima, Manabu Hoshino, Masakazu Hashimoto, and Takahiro Kozawa, Effects of molecular weight and dispersity on performance of main-chain-scission-type resist, Jpn. J. Appl. Phys. 58 (2019) 020909. DOI 10.7567/1347-4065/aafb61
  4. Kazuo Kobayashi, Pulse Radiolysis Studies for Mechanism in Biochemical Redox Reactions, Chem. Rev. 119 (2019) 4413. https://doi.org/10.1021/acs.chemrev.8b00405
  5. T. Kozawa, A. Nakajima, T. Yamada, Y. Muroya, J. J. Santillan, and T. Itani, Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer, Jpn. J. Appl. Phys. 58 (2019) 036501. DOI 10.7567/1347-4065/aafb67
  6. T. Yamada, S. Ishihara, Y. Muroya, J. J. Santillan, S. Yamashita, T. Itani, and T. Kozawa, Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist, Jpn. J. Appl. Phys. 58 (2019) 036503. DOI 10.7567/1347-4065/aaf992
  7. S. Enomoto, T. Yoshino, K. Machida, and T. Kozawa, Incorporation of chemical amplification in dual insolubilization resists, Jpn. J. Appl. Phys. 58 (2019) 056504. DOI 10.7567/1347-4065/ab0645
  8. J. Choi, S. Tojo, D-S Ahn, M. Fujitsuka, S. Miyamoto, K. Kobayashi, H. Ihee, and T. Majima, Proton transfer accompanied with oxidation reaction of adenosine, Chem. Eur, J. 25 (2019) 7711-7718. https://doi.org/10.1002/chem.201900732
  9. T. Kozawa, J. J. Santillan, and T. Itani, Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 32 (2019) 161-167.  https://doi.org/10.2494/photopolymer.32.161
  10. T. Kozawa and T. Tamura, Theoretical study on effects of electron thermal energy on sensitization process of chemically amplified electron beam resists—contribution to resist heating effect in electron beam mask writing, Jpn. J. Appl. Phys. 58 (2019) 116503. DOI 10.7567/1347-4065/ab4b6d
  11. T. Kozawa and T. Tamura, Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography, Jpn. J. Appl. Phys. 58 (2019) 076501. DOI 10.7567/1347-4065/ab236b
  12. T. Kozawa, Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography, Jpn. J. Appl. Phys. 58 (2019) 096502. DOI 10.7567/1347-4065/ab37ff
  13. T. Yamada, Y. Muroya, S. Yamashita, Y. Komuro, D. Kawana, A. Yamazaki, and T. Kozawa, Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists, Jpn. J. Appl. Phys. 58 (2019) 096504. DOI 10.7567/1347-4065/ab3911
  14. H. Kudo, M. Fukunaga, T. Yamada, S. Yamakawa, T. Watanabe, H. Yamamoto, K. Okamoto, and T. Kozawa, Synthesis and Property of Tellurium-Containing Molecular Resist Materials for Extreme Ultraviolet Lithography System, J. Photopolym. Sci. Technol. 32 (2019) 805-810. pdf
  15. Lihua Zhang, Melbert Jeem, Kazumasa Okamoto, Seiichi Watanabe, Fabrication of Iron Oxide Nanoparticles via Submerged Photosynthesis and the Morphologies under Different Light Sources, ISIJ International/Volume 59 (2019) Issue 12 2352-2358. https://doi.org/10.2355/isijinternational.ISIJINT-2019-188
  16. Kyoko Hayashi,Jung-Bum Lee ,Kinya Atsumi,Mana Kanazashi,Tamaki Shibayama,Kazumasa Okamoto,Toshio Kawahara,Toshimitsu Hayashi, In vitro and in vivo anti-herpes simplex virus activity of monogalactosyl diacylglyceride from Coccomyxa sp. KJ (IPOD FERM BP-22254), a green microalga, PLoS ONE 14(7)(2019): e0219305. https://doi.org/10.1371/journal.pone.0219305

2018

  1. H. Yamamoto, H. Kudo, and T. Kozawa, Study on Resist Performance of Noria Derivatives Modified with Various Protection Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation, J. Photopolym. Sci. Technol. 30 (2018) 627-631. https://doi.org/10.2494/photopolymer.30.627
  2. A.Tsuneishi, S. Uchiyama1, R. Hayashi, K. Taki, and T.Kozawa, Relationship between C=C double bondconversion and dissolution kinetics in crosslinking-type photoresists for display manufacture, studied by real-time Fourier transform infraredspectroscopy and quartz crystal microbalancemethods, Jpn. J. Appl. Phys. 57 (2018) DOI:096501.10.7567/JJAP.57.096501
  3. Y. Tsutsui, K. Kobayashi, F. Takeuchi, M. Tsubaki, and T. Kozawa, Reaction Intermediates of Nitric Oxide Synthase from Deinococcus radiodurans as Revealed by Pulse Radiolysis; Evidence for Intramo-lecular Electron Transfer from Biopterin to FeII-O2 Complex, Y. Tsutsui, K. Kobayashi, F. Takeuchi, M. Tsubaki, and T. Kozawa,
    Biochemistry 57 (2018) 1611-1619. https://doi.org/10.1021/acs.biochem.7b00887
  4. M. Ogura, R. Endo, H. Ishikawa, Y. Takeda T. Uchida, K. Iwai, K. Kobayashi and K. Ishimori, Redox-dependent Axial Ligand Replacement and Its Functional Significance in Heme-bound Iron Regulatory Proteins, J. Inorganic Biochem. 182 (2018) 238-248 DOI: 10.1016/j.jinorgbio.2018.01.007
  5. T. Kozawa, J. J. Santillan, and T. Itani, Electron-hole pairs generated in ZrO2 nanoparticle resist upon exposure to extreme ultraviolet radiation, Jpn. J. Appl. Phys. 57 (2018) 026501. DOI 10.7567/JJAP.57.026501
  6. A. Tsuneishi, S. Uchiyama, and T. Kozawa, Dissolution behavior of negative-type photoresists for display manufacture studied by quartz crystal microbalance method, Jpn. J. Appl. Phys. 57 (2018) 046501. DOI 10.7567/JJAP.57.046501
  7. S. Enomoto and T. Kozawa, Study of electron-beam and extreme-ultraviolet resist utilizing polarity change and radical crosslinking, J. Vac. Sci. Technol. B 36 (2018) 031601. https://doi.org/10.1116/1.5023061
  8. T. Kozawa, J. J. Santillan, and T. Itani, Resist image quality control via acid diffusion constant and/or photodecomposable quencher concentration in the fabrication of 11 nm half-pitch line-and-space patterns using extreme-ultraviolet lithography, Jpn. J. Appl. Phys. 57 (2018) 056501. DOI 10.7567/JJAP.57.056501
  9. Z. Fang, X. Cao, L. Tong, Y.Muroya, G. Whitaker, M.Momeni, M. Lin, An improved method for modelling coolant radiolysis in ITER, Fusion Engineering and Design 127 (2018) 91. http://dx.doi.org/10.1016/j.fusengdes.2017.12.031
  10. T. Kozawa, J. J. Santillan, and T. Itani, Relationship between Resolution Blur and Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme-Ultraviolet Lithography, J. Photopolym. Sci. Technol. 31 (2018) 183. https://doi.org/10.2494/photopolymer.31.183
  11. A. Tsuneishi, D. Sakamaki, Q. Gao, T. Shoda, T. Kozawa, and S. Seki, Comparison of radical generation efficiencies of the oxime-based initiator radicals using galvinoxyl radical as an indicator, Jpn. J. Appl. Phys. 57 (2018) 086504. DOI 10.7567/JJAP.57.086504
  12. H. Kudo, M. Fukunaga, K. Shiotsuki, H. Takeda, H. Yamamoto, T. Kozawa, and T. Watanabe, Synthesis of hyperbranched polyacetals containing C-(4-t-butylbenz)calix[4] resorcinarene: Resist properties for extreme ultraviolet (EUV) lithography, Reactive and Functional Polymers 131 (2018) 361. https://doi.org/10.1016/j.reactfunctpolym.2018.08.013
  13. H. Kudo, S. Ohori, H. Takeda, H. Ogawa, T. Watanabe, H. Yamamoto, and T. Kozawa, Synthesis and Property of Tannic Acid Derivatives and Their Application for Extreme Ultraviolet Lithography System, J. Photopolym. Sci. Technol. 31 (2018) 221. https://doi.org/10.2494/photopolymer.31.221
  14. T. Kozawa, Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist, Jpn. J. Appl. Phys. 57 (2018) 126502. DOI 10.7567/JJAP.57.126502
  15. Y. Vesters, J. Jiang, H. Yamamoto, D. D. Simone, T. Kozawa, S. D. Gendt, and G. Vandenberghe, Sensitizers in extreme ultraviolet chemically amplified resists: mechanism of sensitivity improvement, J. Micro/Nanolith. MEMS MOEMS 17 (2018) 043506. https://doi.org/10.1117/1.JMM.17.4.043506
  16. Y. Shang, J. Xiao, H. Weng, F. Li, S. Chen, S. Yamashita, Y. Muroya, M. Lin, Efficient separation of Re(VII) by radiation-induced reduction from aqueous solution, Chem. Eng. J. 341 (2018) 317. https://doi.org/10.1016/j.cej.2018.02.022
  17. R. Singh, T. Kawahara, Y. Ohmi, Y. Ohno, K. Maehashi, K. Matsumoto, K. Okamoto, R. Utsunomiya, M. Yoshimura, Effects of low temperature buffer on carbon nano wall’s growth, Chem. Eng. J. 341 (2018) 317. https://doi.org/10.1016/j.mtcomm.2018.08.012

2017

  1. K. Kobayashi, Sensing Mechanisms in the Redox-Regulated, [2Fe-2S] Cluster-Containing, Bacteria Transcriptional Factor SoxR, Acc. Chem. Res. 50 (2017) 1672-1678. https://doi.org/10.1021/acs.accounts.7b00137
  2. T. Kozawa, J. J. Santillan, and T. Itani, Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10nm half-pitch resolution region, Jpn. J. Appl. Phys. 56 (2017) 016501. DOI 10.7567/JJAP.56.016501
  3. T. Kozawa, J. J. Santillan, and T. Itani, Shot noise limit of chemically amplified resists with photodecomposable quenchers used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 56 (2017) 066501. DOI 10.7567/JJAP.56.066501
  4. S. Fujii, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Itani, Sensitivity enhancement of chemically amplified EUV resist by adding acid generation promoters, Jpn. J. Appl. Phys. 56 (2017) 06GD01-1, DOI 10.7567/JJAP.56.06GD01
  5. M. Fujikawa, K. Kobayashi, Y. Tsutsui, T. Tanaka, T. Kozawa, Rational Tuning of Superoxide Sensitivity in SoxR, the [2Fe-2S] Transcription Factor: Implications of Species-Specific Lysine Residues, Biochemistry, 56 (2017) 403-410. https://doi.org/10.1021/acs.biochem.6b01096
  6. S. Tsukuda, K. Okamoto, H. Yamamoto, T. Kozawa, and T. Omata, Formation of Au nanoparticle arrays on hydrogel 2-D patterns based on poly(vinylpyrrolidone), Jpn. J. Appl. Phys. 56 (2017) 06GD06. DOI 10.7567/JJAP.56.06GG06
  7. T. Kozawa, Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified elfectron beam resist process, Jpn. J. Appl. Phys, 56 (2017) 046502. DOI 10.7567/JJAP.56.046502
  8. H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J.-L. Marignier, M. Mostafavi, and J. Belloni, Synthesis of Metal Nanoparticles and Patterning in Polymeric Films Induced by Electron Nanobeam, J. Phys. Chem. C 121 (2017) 5335. https://doi.org/10.1021/acs.jpcc.6b12543
  9. T. Seki, H. Yamamoto, T. Kozawa, K. Koike, T. Aoki, and J. Matsuo, Fabrication of a Si lever structure made by double-angle etching with reactive gas cluster injection, Appl. Phys. Lett. 110 (2017) 182105. https://doi.org/10.1063/1.4982970
  10. T. Seki, H. Yamamoto, T. Kozawa, T. Shoji, K. Koike, T. Aoki, and J. Matsuo, Angled ethching of Si by ClF3-Ar gas cluster injection, Jpn. J. Appl. Phys. 56 (2017) 06HB02. DOI 10.7567/JJAP.56.06HB02
  11. T. Kozawa, K. Watanabe, K. Matsuoka, H. Yamamoto, Y. Komuro, D. Kawana, and A. Yamazaki, Excluded volume effects caused by high concentration addition of acid generators in chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 56 (2017) 086502. DOI 10.7567/JJAP.56.086502
  12. T. Kozawa and S. Yoshitake, Theoretical study on relationship between exposure pattern width and chemical gradient of 16 nm half-pitch line-and-space patterns in electron beam lithography used for photomask and nanoimprint mold production, Jpn. J. Appl. Phys. 56 (2017) 076501. DOI 10.7567/JJAP.56.076501
  13. T. Kozawa, J. Santillan, and T. Itani, Theoretical study on sensitivity enhancement in energy-deficit region of chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 56 (2017) 106503. DOI 10.7567/JJAP.56.106503
  14. T. Kozawa, Analysis of dissolution factor of line edge roughness formation in chemically amplified electron beam resist, Jpn. J. Appl. Phys. 57 (2018) 126502. DOI 10.7567/JJAP.57.126502
  15. T. Kozawa and T. Tamura, Theoretical study on effects of exposure pattern width on line edge roughness and stochastic defect generation in fabrication of 16 nm half-pitch line-and-space patterns using electron beam lithography, Jpn. J. Appl. Phys. 56 (2017) 116501. DOI 10.7567/JJAP.56.116501
  16. S. Takei, N. Sugino, M. Hanabata, A. Oshima, M. Kashiwakura, T. Kozawa, and S. Tagawa, Ecofriendly ethanol-developable processes for electron beam lithography using positive-tone dextrin resist material, Appl. Phys. Express 10 (2017) 076502. DOI 10.7567/APEX.10.076502
  17. T. Kozawa, J. J. Santillan, T. Itani, Relationship between Sensitization Distance and Photon Shot Noise in Line Edge Roughness Formation of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 30 (2017) 197-203. https://doi.org/10.2494/photopolymer.30.197
  18. M. Fukunaga, H. Yamamoto, T. Kozawa, T. Watanabe, H. Kudo, Synthesis and Property of Tellurium-Containing Polymer for Extreme Ultraviolet Resist Material, J. Photopolym. Sci. Technol. 30 (2017) 103-107. 10.2494/photopolymer.30.103
  19. K. Okamoto, N. Nomura R. Fujiyoshi, K. Umegaki, H. Yamamoto K. Kobayashi, and T. Kozawa, Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes, J. Phys. Chem. A 121 (2017) 9458-9465. https://doi.org/10.1021/acs.jpca.7b09842
  20. H. Yamamoto, H. Kudo, T. Kozawa, Study on Resist Performance of Noria Derivatives Modified with Various Protectio Ratios of Acetal Moieties by means of Extreme Ultraviolet Irradiation, J. Photopolym. Sci. Technol. 30 (2017) 627-631.  https://doi.org/10.2494/photopolymer.30.627
  21. Y. Muroya, S. Yamashita, P. Lertnaisat, S. Sanguanmith, J. Meesungnoen, J.-P. Jay-Gerin and Y. Katsumura, Rate constant for the H + H2O -> OH + H2 reaction at elevated temperatures measured by pulse radiolysis, Phys. Chem. Chem. Phys. 19 (2017) 30834-30841. DOIhttps://doi.org/10.1039/C7CP06010F
  22. F. Wang, P. Archirel, Y. Muroya S. Yamashita, P. Pernot, C. Yin, A. Karim E. Omar, U. Schmidhammer, J.-M. Teuler and M. Mostafavi, Effect of the solvation state of electron in dissociative electron attachment reaction in aqueous solutions, Phys. Chem. Chem. Phys. 19 (2017) 23068-23077. DOIhttps://doi.org/10.1039/C7CP03997B
  23. Z. Fang, X. Cao, L. Tong, Y. Muroya, G. Whitaker, M. Momeni, M. Lin, An improved method for modelling coolant radiolysis in ITER, Fusion Engineering and Design 127 (2017) 91-98. https://doi.org/10.1016/j.fusengdes.2017.12.031
  24. M. Koshimizu, Y. Muroya, S. Yamashita, H. Yamamoto, Y. Fujimoto, K. Asai, Analysis of the relaxation process of electron.hole pairs in α-Al2O3 using transient absorption spectroscopy, J. Mater. Sci.: Mater. Electron. 28 (2017) 7091-7094. https://doi.org/10.1007/s10854-017-6423-7/

2016

  1. K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki, Dynamics of radical cations of PHS in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution, Chem. Phys. Lett. 657 (2016) 44, http://hdl.handle.net/2115/70977
  2. N. Taki, Y. Mizutani, T. Iwata, T. Kojima, H. Yamamoto, T. Kozawa, Optical trapping of nanoparticles on a silicon subwavelength grating and their detectin by an ellipsometric technique, International Journal of Optomechatronics 10 (2016) 24. https://doi.org/10.1080/15599612.2015.1124475
  3. Y. Muroya, A. Mozumder, Ab initio spur size calculation in liquid water at room temperature, Chemical Physics Letters, 657 (2016) 102,https://doi.org/10.1016/j.cplett.2016.05.021
  4. Z. Liu, Z. Fang, Y. Muroya, H. Fu, Yu Yan, Y. Katsumura, M. Lin, Local density augmentation of supercritical water probed by 4,40-bpyH radical: A pulse radiolysis study, Chemical Physics Letters, 657 (2016) 78, DOI:10.1016/j.cplett.2016.05.059
  5.  K. Kobayashi, M. Nakagaki, H. Ishikawa, K. Iwai, M. R. O'Brian, and K. Ishimori, Redox-Dependent Dynamics in Heme-Bound Bacterial Iron Response Regulator (Irr) Protein, Biochemistry, 55 (2016) 4047, https://doi.org/10.1021/acs.biochem.6b00512
  6. T. Kozawa, Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process IV. Validation of simulation model, Jpn. J. Appl. Phys, 55 (2016) 056503, DOI 10.7567/JJAP.55.056503
  7. T. Kozawa, J. J. Santillan, and T. Itani, Analysis of stochastic effects in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist, Jpn. J. Appl. Phys. 55 (2016) 076501. DOI 10.7567/JJAP.55.076501
  8. T. Kozawa, J. J. Santillan, T. Itani, Analysis of line-and-space resist patterns with sub-20 nm half-pitch fabricated using high NA exposure tool of extreme ultraviolet lithography, Jpn. J. Appl. Phys, 55 (2016) 096501, DOI 10.7567/JJAP.55.096501
  9. T. Kozawa, Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size, Jpn. J. Appl. Phys, 55 (2016) 106502,DOI 10.7567/JJAP.55.106502
  10. T. Kozawa, J. J. Santillan, T. Itani, Theoretical study of relationships among resolution, line width roughness, and sensitivity of chemically amplified extreme ultraviolet resists with photodecomposable quenchers, Jpn. J. Appl. Phys, 55 (2016) 116501, DOI 10.7567/JJAP.55.116501
  11. T. Kozawa, Requirement for Suppression of Line Width Roughness in Fabrication of Line-and-Space Patterns with 7 nm Quarter-Pitch Using Electron Beam Lithography with Chemically Amplified Resist Process, J. Photopolym.. Sci. Tech. 29 (2016) 809, https://doi.org/10.2494/photopolymer.29.809
  12. H. Yamamoto, S. Tagawa, H. Kudo, K. Okamoto, and T. Kozawa, Chemically Amplified Molecular Resists based on Noria Derivatives Containing Adamantyl Ester Groups for Electron Beam Lithography, J. Vac. Sci. Technol. B 34 (2016) 041606, https://doi.org/10.1116/1.4953068
  13. H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa, Controlled Array of Gold Nanoparticles by Combination of Nano Imprint and Self-assembly, J. Photopolym. Sci. Technol. 29 (2016) 765, 10.2494/photopolymer.29.765
  14. A. Ohnuma, H. Yamamoto, T. Kozawa, and B. Ohtani, Structural Control of Hybrid Colloidal Particle Surface by Plasma-etching Treatment, Chem. Lett. 45 (2016) 979, https://doi.org/10.1246/cl.160408
  15. H. Kudo, H. Ogawa, H. Yamamoto, and T. Kozawa, Synthesis and Resist Properties of Calixarene Polymers with Pendant Haloalkyl Groups, J. Photopolym. Sci. Technol. 29 (2016) 495, https://doi.org/10.2494/photopolymer.29.495
  16. T. Kozawa, J. J. Santillan, and T. Itani, Challenges in Development of Sub-10 nm Resist Materials, J. Photopolym. Sci. Technol. 29 (2016) 717-723. https://doi.org/10.2494/photopolymer.29.717
  17. T. Kozawa, J. J. Santillan, and T. Itani, Effect of thermalization distance on stochastic phenomena in 7-nm-half-pitch line-and-space pattern fabrication using chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. 55 (2016) 026504, DOI 10.7567/JJAP.55.026504

2015

  1. S. Fujii, T. Kozawa, K. Okamoto, J. J. Santillan, and T. Itani, Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 54 (2015) 116501, DOI 10.7567/JJAP.54.116501
  2. T. Kozawa, Optimum concentration ratio of photodecomposable quencher to acid generator in chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. 54 (2015) 126501, DOI 10.7567/JJAP.54.126501
  3. T. Kozawa, Relationships between quencher diffusion constant and exposure dose dependences of line width, line edge roughness, and stochastic defect generation in extreme ultraviolet lithography, Jpn. J. Appl. Phys. 54 (2015) 016502, DOI 10.7567/JJAP.54.016502
  4. Takahiro Kozawa, Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch (7nm space width and 21nm line width) using electron beam lithography with chemically amplified resist processes: I. Relationship between sensitivity and chemical gradient, Jpn. J. Appl. Phys. 54 (2015) 056501, DOI 10.7567/JJAP.54.056501
  5. T. Kozawa, Effects of diffusion constant of photodecomposable quencher on chemical gradient of chemically amplified extreme-ultraviolet resists, Jpn. J. Appl. Phys. 54 (2015) 056502, DOI 10.7567/JJAP.54.056502
  6. T. Kozawa, J. J. Santillan, and T. Itani, Effect of thermalization distance on chemical gradient of line-and-space patterns with 7 nm half-pitch in chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. 54 (2015) 066501, DOI 10.7567/JJAP.54.066501
  7. N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki, Study on radiation chemistry of fluorinated polymers for EUV resist, Jpn. J. Appl. Phys. 54 (2015) 06FE03, DOI 10.7567/JJAP.54.06FE03
  8. M. Fujikawa, K. Kobayashi, and T. Kozawa, Redox-dependent DNA distortion in a SoxR protein-promoter complex studied using fluorescent probes, J. Biochem. 157 (2015) 389, DOI: 10.1093/jb/mvu085
  9. S. Fujii, T. Kozawa, K. Okamoto, J. J. Santillan, and T. Itani, Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement, Jpn. J. Appl. Phys. 54 (2015) 086502, DOI 10.7567/JJAP.54.086502
  10. T. Kozawa, Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist processes: II. Stochastic effects, Jpn. J. Appl. Phys. 54 (2015) 096501, DOI 10.7567/JJAP.54.096501
  11. Takahiro Kozawa, Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: III. Post exposure baking on quartz substrates, Jpn. J. Appl. Phys. 54 (2015) 096703, DOI 10.7567/JJAP.54.096703
  12. M. Mitsuyasu, H. Yamamoto, and T. Kozawa, Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 28 (2015) 119,  https://doi.org/10.2494/photopolymer.28.119
  13. H. Kudo, S. Matsubara, H. Yamamoto, and T. Kozawa, Synthesis and Resist Properties of Hyperbranched Polyacetals, J. Photopolym. Sci. Technol. 28 (2015) 125, 10.2494/photopolymer.28.125
  14. H. Kudo, S. Matsubara, H. Yamamoto, and T. Kozawa, Synthesis of Hyperbranched Polyacetals via An + B2-Type Polyaddition (n=3, 8, 18, and 21): Candidate Resists for Extreme Ultraviolet Lithography, J. Polym. Sci. Part A: Polym. Chem. 53 (2015) 2343, https://doi.org/10.1002/pola.27686
  15. T. Kozawa, J. J. Santillan, and T. Itani, Quencher diffusion in chemically amplified poly(4-hydroxystyrene-co-t-butyl methacrylate) resist, Jpn. J. Appl. Phys. 54 (2015) 118002, DOI 10.7567/JJAP.54.118002
  16. Y. Komuro, D. Kawana, T. Hirayama, K. Ohmori, and T. Kozawa, Acid Quantum Efficiency of Anion-bound Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation, J. Photopolym. Sci. Technol. 28 (2015) 501, https://doi.org/10.2494/photopolymer.28.501
  17.  T. Kozawa, Resist material options for extreme ultraviolet lithography, Adv. Opt. Techn. 4 (2015) 311, https://doi.org/10.1515/aot-2015-0028
  18. T. Kozawa, J. J. Santillan, and T. Itani, Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 28 (2015) 669, https://doi.org/10.2494/photopolymer.28.669
  19. J. Ma, S. Yamashita, Y. Muroya, Y. Katsumura and M. Mostafavi, Deciphering the reaction between a hydrated electron and a hydronium ion at elevated temperatures, Phys. Chem. Chem. Phys. 17 (2015) 22934, https://doi.org/10.1039/C5CP04293C
  20. Y. Komuro, D. Kawana, T. Hirayama, K. Ohomori, and T. Kozawa, Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 54 (2015) 036506, DOI 10.7567/JJAP.54.036506
  21. T. Kozawa, Effects of dose shift on line width, line edge roughness, and stochastic defect generation in chemically amplified extreme ultraviolet resist with photodecomposable quencher, Jpn. J. Appl. Phys. 54 (2015) 016503, DOI 10.7567/JJAP.54.016503
  22. K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and K. Umegaki, Pulse radiolysis study of polystyrene-based polymers with added photoacid generators: Reaction mechanism of extreme-ultraviolet and electron-beam chemically amplified resist, Jpn. J. Appl. Phys. 54 (2015) 026501, DOI 10.7567/JJAP.54.026501
  23. H. Yamamoto, H. Kudo, and T. Kozawa, Study on resist performance of chemically amplifeid molecular resists based on cyclic oligomers, Microelectron. Eng. 133 (2015) 16, https://doi.org/10.1016/j.mee.2014.11.002
  24. T. Kozawa, J. J. Santillan, and T. Itani, Feasibility study of sub-10-nm-half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: II. Stochastic effects, Jpn. J. Appl. Phys. 54 (2015) 036507, DOI 10.7567/JJAP.54.036507
  25. K. Kobayashi, M. Fujikawa, and T. Kozawa, Binding of Promoter DNA to SoxR Protein Decreases the Reduction Potential of the [2Fe-2S] Cluster, Biochemistry 54 (2015) 334, https://doi.org/10.1021/bi500931w
  26. T. Nakai, H. Ito, K. Kobayashi, Y. Takahashi, H. Hori, M. Tsubaki, K. Tanizawa, and T. Okajima, The Radical S-Adenosyl-L-methionine Enzyme QhpD Catalyzes Sequential Formation of Intra-protein Sulfur-to-Methylene Carbon Thioether Bonds, J. Biol. Chem. 292 (2015) 11144, DOI: 10.1074/jbc.M115.638320
  27. H.Yamamoto, T. Seki , J. Matsuo , K. Koike, and T. Kozawa, High-aspect-ratio patterning by ClF3-Ar neutral cluster etching, Microelectron. Eng. 141 (2015) 145-149, https://doi.org/10.1016/j.mee.2015.03.006
  28. K. Hata, A. Urushibara, S. Yamashita, M. Lin, Y. Muroya, N. Shikazono, A. Yokoya, H. Fu, and Y. Katsumura, Chemical repair activity of free radical scavenger edaravone: reduction reactions with dGMP hydroxyl radical adducts and suppression of base lesions and AP sites on irradiated plasmid DNA, J. Radiat. Res. 56 (2015) 59, DOI: 10.1093/jrr/rru079
  29. S.Yamashita, K. Iwamatsu, Y. Maehashi, M. Taguchi, K. Hata, Y. Muroya, and Y. Katsumura, Sequential radiation chemical reactions in aqueous bromide solutions: pulse radiolysis experiment and spur model simulation, RSC Adv. 5 (2015) 25877, https://doi.org/10.1039/C5RA03101J

2014

  1. T. Kozawa, J. J. Santillan, and T. Itani, Effects of deprotonation efficiency of protected units on line edge roughness and stochastic defect generation in chemically amplified resist processes for 11 nm node of extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 116504, DOI 10.7567/JJAP.53.116504
  2. S. Takei, A. Oshima, T. Oyama, K. Ito, M. Kashiwakura, T. Kozawa, S. Tagawa, and M. Hanabata, Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 116505, DOI:10.7567/JJAP.53.116505
  3. T. Kozawa, J.J. Santillan, and T. Itani, Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model, Jpn. J. Appl. Phys. 53 (2014) 106501, DOI 10.7567/JJAP.53.106501
  4. T. Kozawa, J. J. Santillan, and T. Itani, Effect of molecular weight and protection ratio on line edge roughness and stochastic defect generation in chemically amplified resist processes of extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 084002, DOI 10.7567/JJAP.53.084002
  5. T. Kozawa, J. J. Santillan, and T. Itani, Dependence of stochastic defect generation on quantum efficiency of acid generation and effective reaction radius for deprotection in chemically amplified resist process using extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 076502, DOI 10.7567/JJAP.53.076502
  6. S. Takei, A. Oshima, T. Ichikawa, A. Sekiguchi, M. Kashiwakura, T. Kozawa, S. Tagawa, T. Oyama, S. Ito, and H. Miyasaka, Organic solvent-free water-developable sugar resist material derived from biomass in green lithography, Microelectron. Eng. 122 (2014) 70, https://doi.org/10.1016/j.mee.2014.02.026
  7. T. Kozawa and T. Hirayama, Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. 53 (2014) 066502, DOI 10.7567/JJAP.53.066502
  8. T. Kozawa, Effect of photodecomposable quencher on latent image quality in extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 066508, DOI 10.7567/JJAP.53.066508
  9. T. Kozawa, J. J. Santillan, and T. Itani, Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 066504, DOI 10.7567/JJAP.53.066504
  10. T. Kozawa, J. J. Santillan, and T. Itani, Effects of effective reaction radius for neutralization on performance of chemically amplified resists, Jpn. J. Appl. Phys. 53 (2014) 06JC02, DOI 10.7567/JJAP.53.06JC02
  11. T. Kozawa, Relationship between stochasticity and wavelength of exposure source in lithography, Jpn. J. Appl. Phys. 53 (2014) 066505, DOI 10.7567/JJAP.53.066505
  12. T. Kozawa, J. J. Santillan, and T. Itani, Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists, Jpn. J. Appl. Phys. 53 (2014) 036503, DOI 10.7567/JJAP.53.036503
  13. T. Kozawa, J. J. Santillan, and T. Itani, Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 27 (2014) 11, pdf
  14. T. Kozawa and T. Hirayama, Acid diffusion length in contact hole imaging of chemically amplified extreme ultraviolet resists, Jpn. J. Appl. Phys. 53 (2014) 016503, DOI 10.7567/JJAP.53.016503
  15. H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa, Controlled arrangement of nanoparticles capped with protecting ligand on Au nanopatterns, Microelectron. Eng. 121 (2014) 108, https://doi.org/10.1016/j.mee.2014.02.028
  16. H. Yamamoto, T. Kozawa, and S. Tagawa, Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method, Microelectron. Eng. 129 (2014) 65, https://doi.org/10.1016/j.mee.2014.07.019
  17. H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa, Position Control of Metal Nanoparticles by Self-Assembly, J. Photopolym. Sci. Technol. 27 (2014) 243,  https://doi.org/10.2494/photopolymer.27.243
  18. T. Amaya, Y. Abe, H. Yamamoto, T. Kozawa, and T. Hirao, Conductivity of poly(2-methoxyaniline-5-phosphonic acid)/amine complex and its charge dissipation property in electron-beam lithography, Synthetic Metals 198 (2014) 88, https://doi.org/10.1016/j.synthmet.2014.09.027
  19.  H. Horibe, K. Ishiguro, T. Nishiyama, A. Kono, K. Enomoto, H. Yamamoto, M. Endo, and S. Tagawa, Sensitivity of a Chemically Amplified Three-component Resist Containing a Dissolution Inhibitor for Extreme Ultraviolet Lithography, Polymer J. 46 (2014) 234, https://doi.org/10.1038/pj.2013.95
  20.  Y. Komuro, H. Yamamoto, K. Kobayashi, Y. Utsumi, K. Ohmoro, and T. Kozawa, Acid generation mechanism in anion-bound chemically amplified resists used for extreme ultraviolet lithography, Jpn. J. Appl. Phys. 53 (2014) 116503, DOI 10.7567/JJAP.53.116503
  21. K. Kobayashi, M. Fujikawa, and T. Kozawa, Oxidative Stress Sensing by the Iron-Sulfur Cluster in the Transcription Factor, SoxR, J. Inorg. Biochem. 133 (2014) 87, DOI: 10.1016/j.jinorgbio.2013.11.008
  22. M. Fujikawa, K. Kobayashi, and T. Kozawa, Mechanistic Studies on Formation of the Dinitrosyl Iron Complex of the [2Fe-2S] Cluster of SoxR Protein, J. Biochem. 156 (2014) 163, DOI: 10.1093/jb/mvu029
  23. K. Kobayashi, Y. Seike, A. Saeki, T. Kozawa, F. Takeuchi, and M. Tsubaki, Pulse Radiolysis Study of the Dynamics of Ascorbic Acid Free Radicals within a Liposomal Environment, PhysChemPhys 15 (2014) 2994, DOI: 10.1002/cphc.201402297

2013

  1. T. Itani and T. Kozawa, Resist Materials and Processes for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 52 (2013) 010002, DOI 10.7567/JJAP.52.010002
  2. T. Kozawa, Theoretical Study on Acid Diffusion Length in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 52 (2013) 016501, DOI 10.7567/JJAP.52.016501
  3. Y. Komuro, H. Yamamoto, Y. Utsumi, K. Ohomori, and T. Kozawa, Electron and Hole Transfer in Anion-Bound Chemically Amplified Resists Used in Extreme Ultraviolet Lithography, Appl. Phys. Express 6 (2013) 014001, DOI 10.7567/APEX.6.014001
  4. T. Kozawa, J. J. Santillan, and T. Itani, Analysis of Stochastic Effect in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography, Appl. Phys. Express 6 (2013) 026502, DOI 10.7567/APEX.6.026502
  5. T. Kozawa and T. Hirayama, Chemical Gradient of Contact Hole Latent Image Created in Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 52 (2013) 046502, DOI 10.7567/JJAP.52.046502
  6. T. Kondoh, J. Yang, K. Norizawa, K. Kan, T. Kozawa, A. Ogata, S. Tagawa, and Y. Yoshida, Femtosecond pulse radiolysis study of geminate ion recombination in biphenyl-dodecane solution, Radiat. Phys. Chem. 84 (2013) 30, https://doi.org/10.1016/j.radphyschem.2012.06.051
  7. T. Kozawa, J. J. Santillan, and T. Itani, Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 52 (2013) 076502, DOI 10.7567/JJAP.52.076502
  8. T. Kozawa, J. J. Santillan, and T. Itani, Acid Diffusion Length in Line-and-Space Resist Patterns Fabricated by Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 52 (2013) 076501. DOI 10.7567/JJAP.52.076501
  9. T. Kozawa, Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet thography, Jpn. J. Appl. Phys. 52 (2013) 076504, DOI:10.7567/JJAP.57.056501
  10. H. Yamamoto, T. Kozawa, S. Tagawa, M. Naito, J. -L. Marignier, M. Mostafavi, and J. Belloni, Radiation-induced synthesis of metal nanoparticles in ethers THF and PGMEA, Radiat. Phys. Chem. 91 (2013) 148, 10.1016/j.radphyschem.2013.05.019 
  11. K. Okamoto, R. Matsuda, H. Yamamoto, T. Kozawa, S. Tagawa, R. Fujiyoshi, and T. Sumiyoshi, Deprotonation of Poly(4-hydroxystyrene) Intermediates: Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist, Jpn. J. Appl. Phys. 52 (2013) 06GC04, DOI 10.7567/JJAP.52.06GC04
  12. T. Kozawa and T. Hirayama, Stochastic Effect on Contact Hole Imaging of Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 52 (2013) 086501, DOI 10.7567/JJAP.52.086501
  13. H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa, Formation of nanoscale reaction field using combination of top-down and bottom-up nanofabricaiton, Microelectronic Engineering 110 (2013) 369, https://doi.org/10.1016/j.mee.2013.02.066
  14. H. Yamamoto, A. Ohnuma, B. Ohtani, and T. Kozawa, Controlled Array of Silver Nanoparticles on Nanopatterns, J. Photopolym. Sci. Technol. 26 (2013) 495, https://doi.org/10.2494/photopolymer.26.495
  15. T. Kozawa, Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists, J. Photopolym. Sci. Technol. 26 (2013) 643. https://doi.org/10.2494/photopolymer.26.643
  16. S. L. Butarbutar, Y. Muroya, L. M. Kohan, S. Sanguanmith, J. Meesungnoen, J.-P. Jay-Gerin, On the Temperature Dependence of the RateConstant of the Bimolecular Reaction of two Hydrated Electrons, Atom Indonesia, 39 (2013) 51, DOI: https://doi.org/10.17146/aij.2013.231
  17.  A. Tsuda, R. Ishikawa, H. Koteishi, K. Tange, Y. Fukuda, K. Kobayashi, T. Inoue, and M.i Nojiri, Structural and mechanistic insights into the electron-flow through protein for cytochrome c-tethering copper nitrite reductase, J. Biochem 154 (2013) 51, DOI: 10.1093/jb/mvt023
  18.  R. Mariam; R., Rahman, F.Takeuchi, K. Kobayashi, M. Tsubaki, Electron transfer reactions of candidate tumor suppressor 101F6 protein, a cytochrome b561 homologue, with ascorbate and monodehydroascorbate radical, Biochemistry 52(2013) 3660, DOI: 10.1021/bi301607s

2012

  1. K. Enomoto, K. Arimitsu, A. Yoshizawa, R. Joshi, H. Yamamoto, A. Oshima, T. Kozawa, and S. Tagawa, Acid Generation Mechanism for Extreme Ultraviolet Resists Containing Pinanediol Monosulfonate Acid Amplifiers: A Pulse, Radiolysis Study, Jpn. J. Appl. Phys., 51 (2012) 046502. DOI 10.1143/JJAP.51.046502
  2. T. Kozawa, Lower Limit of Line Edge Roughness in High-Dose Exposure of Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys., 51 (2012) 06FC01, DOI 10.1143/JJAP.51.06FC01
  3. T. Kozawa, J. J. Santillan, and T. Itani, Modeling and Simulation of Acid Diffusion in Chemically Amplified Resists with Polymer-Bound Acid Generator, Appl. Phys. Express 5 (2012) 074301, DOI 10.1143/APEX.5.074301
  4.  S. Takei, A. Oshima, T. Wakabayashi, T. Kozawa, and S. Tagawa, Eco-friendly electron beam lithography using water-developable resist material derived from biomass, Appl. Phys. Lett., 101 (2012) 033106, https://doi.org/10.1063/1.4737639
  5. T. Kozawa, Relationship between Stochastic Effect and Line Edge Roughness in Chemically Amplified Resists for Extreme Ultraviolet Lithography Studied by Monte Carlo Simulation, Jpn. J. Appl. Phys., 51 (2012) 086504, DOI 10.1143/JJAP.51.086504
  6. T. Kozawa, Relationship between Absorption Coefficient and Line Edge Roughness of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, J. Photopolym. Sci. Technol. 25 (2012) 625, 10.2494/photopolymer.25.625
  7. H. Yamamoto, A. Ohnuma, T. Kozawa, and B. Ohtani, Location Control of Nanoparticles Using Combination of Top-down and Bottom-up Nano-fabrication, J. Photopolym. Sci. Technol. 25 (2012) 449, 10.2494/photopolymer.25.449
  8. H. Yamamoto, T. Kozawa, and S. Tagawa, Dissolution Kinetics in Polymer-Bound and Polymer-Blended Photo-Acid Generators, J. Photopolym. Sci. Technol. 25 (2012) 693, DOI:10.2494/photopolymer.25.693
  9. K. Okamoto, T. Kozawa, K. Oikawa, T. Hatsui, M. Nagasono, T. Kameshima, T. Togashi, K. Tono, M. Yabashi, H. Kimura, Y. Senba, H. Ohashi, R. Fujiyoshi, and T. Sumiyoshi, Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser, Appl. Phys. Express 5 (2012) 096701, DOI 10.1143/APEX.5.096701
  10. T. Kozawa, J. J. Santillan, and T. Itani, Dependence of Dissolution Point on Pattern Size of Chemically Amplified Extreme Ultraviolet Resist, Jpn. J. Appl. Phys. 51 (2012) 108002, DOI 10.1143/JJAP.51.108002
  11. T. Kozawa and A. Erdmann, Resist Properties Required for 6.67nm Extreme Ultraviolet Lithography, Jpn.J. Appl. Phys. 51 (2012) 106701, DOI 10.1143/JJAP.51.106701
  12. T. Kozawa, Stochastic Effect of Acid Catalytic Chain Reaction in Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 51 (2012) 116503, DOI 10.1143/JJAP.51.116503
  13. T. Kozawa, Effect of Molecular Weight and Protection Ratio on Latent Image Fluctuation of Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 51 (2012) 126501, DOI 10.1143/JJAP.51.126501
  14. M. Fujikawa, K. Kobayashi, and T. Kozawa, Direct Oxidation of the [2Fe-2S] Cluster in SoxR Protein by Superoxide, J. Biol. Chem. 287 (2012) 35702, 10.1074/jbc.M112.395079
  15. K. Nakajima, K. Kitanishi, K. Kobayashi, N. Kobayashi, J. Igarashi, and T. Shimizu, Leu65 in the heme distal side is critical for the stability of the Fe(II)-O2 complex of YddV, a globin-coupled oxygen sensor diguanylate cyclase, J. Inorg. Biochem. 108 (2012) 163, DOI: 10.1016/j.jinorgbio.2011.09.019
  16. S. Yamashita, G. Baldacchino, T. Maeyama, M. Taguchi, Y. Muroya, M. Lin, A. Kimura, T. Murakami, and Yosuke Katsumura, Mechanism of radiation-induced reactions in aqueous solution of coumarin-3-carboxylic acid: Effects of concentration, gas and additive on fluorescent product yield, Free Radic. Res., 46 (2012) 861, DOI: 10.3109/10715762.2012.684879
  17. Y. Muroya, S. Sanguanmith, J. Meesungnoen, M. Lin, Y. Yan, Y. Katsumura, and J.-P. J.-G., Time-dependent yield of the hydrated electron in subcritical and supercritical water studied by ultrafast pulse radiolysis and Monte-Carlo Simulation, Phys. Chem. Chem. Phys., 14 (2012) 14325, DOIhttps://doi.org/10.1039/C2CP42260C
  18. T. Fujiwara, T. Saito, Y. Muroya, H. Sawahata, Y. Yamashita, S. Nagasaki, K. Okamoto, H. Takahashi, M. Uesaka, Y. Katsumura, S. Tanaka, Isotopic Ratio and Vertical Distribution of Radionuclides in Soil Affected by the Accident of Fukushima Dai-ichi Nuclear Power Plants, J. Environ. Radioact, 113 (2012) 37, https://doi.org/10.1016/j.jenvrad.2012.04.007
  19. S. Sanguanmith, J. Meesungnoen, Y. Muroya, M. Lin, Y. Katsumura and J. -P. Jay-Gerin, On the Spur Lifetime and Its Temperature Dependence in the Low Linear Energy Transfer Radiolysis of Water, Phys. Chem. Chem. Phys., 14 (2012) 16731, https://doi.org/10.1039/C2CP42826A
  20. D. N. Tuan, H. Yamamoto, and S. Tagawa, Study on Resist Performance of Polymer-Bound and Polymer-Blended Photo-Acid Generators, Jpn. J. Appl. Phys. (2012), 51,086503-1-086503-5, DOI 10.1143/JJAP.51.086503
  21. H. Fu, M. Lin, Y. Muroya, Y. Katsumura, Pulse radiolysis studies of intermolecular charge transfer involving tryptophan and three-electron-bonded intermediates derived from methionine, Res. Chem. Intermed., 38 (2012) 135, https://doi.org/10.1007/s11164-011-0331-x
  22. L. Wan, J. Peng, M. Lin, Y. Muroya, Y. Katsumura, H. Fu, Hydroxyl radical, sulfate radical and nitrate radical reactivity toward crown ethers in aqueous solutions, Radiat. Phys. Chem., 81 (2012) 524, https://doi.org/10.1016/j.radphyschem.2012.01.025
  23. N. Taki, Y. Mizutani, T. Iwata, T. Kojima, H. Yamamoto, T. Kozawa, Ellipsometrical detection of optical trapped nanoparticles by periodically localized light, Proc. of SPIE 8430, 84300Y-1-84300Y-8 (2012), https://doi.org/10.1117/12.922879

2011

  1. K. Kobayashi, M. Mizuno, M. Fujikawa, and Y. Mizutani, Protein Conformational Changes in the Oxidative-Stress Sensor, SoxR, upon Redox Change of the [2Fe-2S] Cluster Probed with Ultraviolet Resonance Raman Spectroscopy, Biochemistry 50 (2011) 9468, DOI: 10.1021/bi201526y
  2. K. Kitanishi, K. Kobayashi, T. Uchida, K. Ishimori, J. Igarashi, and T. Shimizu, Identification and functional and spectral characterization of a globin-coupled histidine kinase from Anaeromyxobacter sp. Fw109-5, J. Biol. Chem. 286 (2011) 35522, DOI: 10.1074/jbc.M111.274811
  3. J. Igarashi, K. Kobayashi, and A.i Matsuoka, A hydrogen-bonding network formed by the B10-E7-E11 residues of a truncated hemoglobin from Tetrahymena pyriformis is critical for stability of bound oxygen and nitric oxide detoxification, J. Biol. Inorg. Chem. 16, (2011) 599, DOI: 10.1007/s00775-011-0761-3
  4. H. Tsubokura, A.Ohshima, T. Ohyama-Gowa, H. Yamamoto, M. Ito, S. Tagawa, and M. Washio, Nanofabrication of sulfonated polystyrene-g-FEP with silver ion (Ag+) using ion beam direct etching and reduction, Journal of Photopolymer Science and Technology 24 (2011) 513, https://doi.org/10.2494/photopolymer.24.513
  5. T.G. Ohyama, A. Ohshima, H. Yamamoto, S. Tagawa, and M.Washio, Study on positive-negative inversion of chlorinated resist materials, Applied Physics Express 4 (2011) 076501/1-076501/3, DOI 10.1143/APEX.4.076501
  6. T. Kozawa and T. Itani, Wavelength Dependence of Lithography Resolution in Extreme Ultraviolet Region, Appl. Phys. Express 4 (2011) 126501, DOI 10.1143/APEX.4.126501
  7. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist, Jpn. J. Appl. Phys. 50 (2011) 126501, DOI 10.1143/JJAP.50.126501
  8. T. Kozawa and S. Tagawa, Theoretical Study of Exposure Latitude of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 50 (2011) 106502, DOI 10.1143/JJAP.50.106502
  9. S. Takei, A. Oshima, A. Sekiguchi, N. Yanamori, M. Kashiwakura, T. Kozawa, and S. Tagawa, Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer, Appl. Phys. Express 4 (2011) 106502, DOI 10.1143/APEX.4.106502
  10. A. Saeki, N. Yamamoto, Y. Yoshida, and T. Kozawa, Geminate Charge Recombination in Liquid Alkane with Concentrated CCl4: Effects of CCl4 Radical Anion and Narrowing of Initial Distribution of Cl, J. Phys. Chem. A 115 (2011) 10166 10173., DOI: 10.1021/jp205989r
  11. H. Yamamoto, T. Kozawa, S. Tagawa, T. Mimura, T. Iwai, and J. Onodera, Dissolution Kinetics in Chemically Amplified EUV Resist, J. Photopolym. Sci. Technol. 24 (2011) 405. https://doi.org/10.2494/photopolymer.24.405
  12. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Assessment and Extendibility of Chemically Amplified Resists for Extreme Ultraviolet Lithography: Consideration of Nanolithography beyond 22nm Half-Pitch, Jpn. J. Appl. Phys. 50 (2011) 076503. DOI 10.1143/JJAP.50.076503
  13. T. Kozawa and S. Tagawa, Effect of Acid Generator Decomposition during Exposure on Acid Image Quality of Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 50 (2011) 076505., DOI 10.1143/JJAP.50.076505
  14. T. Kozawa and S. Tagawa, Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness, and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists, J. Photopolym. Sci. Technol. 24 (2011) 076503. https://doi.org/10.2494/photopolymer.24.137
  15. Y. Tajima, K. Okamoto, T. Kozawa, S. Tagawa, R. Fujiyoshi, and T. Sumiyoshi, Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography, Jpn. J. Appl. Phys. 50 (2011) 06GD03. DOI 10.1143/JJAP.50.06GD03
  16. T. Kozawa and S. Tagawa, Relationship of Electron Diffusion Length to Line Edge Roughness in Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 50 (2011) 036505. DOI 10.1143/JJAP.50.036505
  17. T. Kozawa and S. Tagawa, Thermalization Distance of Electrons Generated in Poly(4-hydroxystyrene) Film Containing Acid Generator upon Exposure to Extreme Ultraviolet Radiation, Jpn. J. Appl. Phys. 50 (2011) 030209. DOI 10.1143/JJAP.50.030209
  18. T. Kozawa, H. Yamamoto, and S. Tagawa, Optimum Dissolution Point of Chemically Amplified Resists in Terms of Trade-Off Relationships between Resolution, Line Edge Roughness, and Sensitivity, Jpn. J. Appl. Phys. 50 (2011) 026502, DOI 10.1143/JJAP.50.026502
  19. T. Kozawa and A. Erdmann, Feasibility Study of Chemically Amplified Resists for Short Wavelength Extreme Ultraviolet Lithography, Appl. Phys. Express 4 (2011) 026501, DOI 10.1143/APEX.4.026501
  20. T. Kozawa, S. Tagawa, R. Ohnishi, T. Endo, and R. Sakamoto, Backexposure Effect in Chemically Amplified Resist Process upon Exposure to Extreme Ultraviolet Radiation, Jpn. J. Appl. Phys. 50 (2011) 016504. DOI 10.1143/JJAP.50.016504

2010

  1. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist,, Appl. Phys. Express 3 (2010) 0365 1,DOI 10.1143/APEX.3.036501
  2. T. Kozawa and S. Tagawa, Radiation Chemistry in Chemically Amplified Resists, Jpn. J. Appl. Phys. 49 (2010) 030001.【JJAP Invited Review】, DOI 10.1143/JJAP.49.030001
  3. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Diffusion Control Using Matrix Change during Chemical Reaction for Inducing Anisotropic Diffusion in Chemically Amplified Resists, Jpn. J. Appl. Phys. 49 (2010) 036506, DOI 10.1143/JJAP.49.036506
  4. T. Kozawa and S. Tagawa, Relationship between Normalized Image Log Slope and Chemical Gradient in Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 49 (2010) 06GF02, DOI 10.1143/JJAP.49.06GF02
  5. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 49 (2010) 066504, DOI 10.1143/JJAP.49.066504
  6. T. Kozawa, H. Yamamoto, and S. Tagawa, Effect of Inhomogeneous Acid Distribution on Line Edge Roughness- Relationship to Line Edge Roughness Originating from Chemical Gradient, J. Photopolym. Sci. Technol. 23 (2010) 625, https://doi.org/10.2494/photopolymer.23.625
  7. S. Higashino, A. Saeki, K. Okamoto, S. Tagawa, and T. Kozawa, Formation and Decay of Fluorobenzene Radical Anions Affected by Their Isomeric Structures and the Number of Fluorine Atoms, J. Phys. Chem. A 114 (2010) 8069, https://doi.org/10.1021/jp102828g
  8. S. Ikeda, K. Okamoto, H. Yamamoto, A.Saeki, S. Tagawa, and T. Kozawa, Radiation Chemistry of Fluoronaphthalene as a Candidate for Absorption Enhancement Component of Chemically Amplified Extreme Ultraviolet Resists, Jpn. J. Appl. Phys. 49 (2010) 096504, DOI 10.1143/JJAP.49.096504
  9. T. Kozawa, H. Yamamoto, and S. Tagawa, Relationship between Line Edge Roughness and Fluctuation of Acid Concentration in Chemically Amplified Resist, Jpn. J. Appl. Phys. 49 (2010) 096506, DOI 10.1143/JJAP.49.096506
  10. K. Okamoto, M. Tanaka, T. Kozawa, and S. Tagawa, Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies, Jpn. J. Appl. Phys. 49 (2010) 106501, DOI 10.1143/JJAP.49.106501
  11. T. Kozawa, H. Oizumi, T. Itani, and S. Tagawa, Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography, Jpn. J. Appl. Phys. 49 (2010) 116505, 10.1143/JJAP.49.116505
  12. K. Kan, J. Yang, T. Kondoh, K. Norizawa, A. Ogata, T. Kozawa, and Y. Yoshida, Simulation study of sub-femtosecond electron bunch generation using photocathode RF gun linac, Nucl. Instrum. Meth. A 622 (2010) 35, https://doi.org/10.1016/j.nima.2010.06.223
  13. K. Kobayashi, Evidence of formation of adenine dimer cation radical in DNA The Importance of Adenine Cation Base Stacking, J. Phys. Chem. B 114 (2010) 5600, https://doi.org/10.1021/jp100589w
  14. K. Kobayashi, A. Tanaka, H. Takahashi, J. Igarashi, Y. Ishituka, and T. Shimizu, Catalysis and Oxygen Binding of EcDOS, a Heme-based Oxygen sensor Enzyme from Escherichia coli, J. Biochem. 148 (2010) 693, 10.1093/jb/mvq103
  15. K. Kitanishi, K. Kobayashi, Y. Kawamura, T. Ogura, K. Nakajima, J. Igarashi, A.Tanaka, and T. Shimizu, Important Roles of Tyr43 at the Putative Heme Distal Side in Oxygen Recognition and Stability of the Fe(II)-O2 Complex of YddV, a Globin-Coupled Heme-Oxygen Sensor Diguanylate Cyclase, Biochemistry49 (2010) 10381, https://doi.org/10.1021/bi100733q