1. Application of machine learning to development of resist materials and lithography processes –image recognition, feature extraction, correlation analysis, and Bayesian optimization,
    Jin Yuqing, The 27th SANKEN International Symposium 2024
  2. Relationship between shot noise (stochasticity) and diffusion (smoothing) in resist processes for extreme ultraviolet lithography,
    Takahiro Kozawa, 36th International Microprocesses and Nanotechnology Conf. 2023
  3. Relationship between defect risks and effective reaction radius for deprotection in chemically amplified resist process for extreme ultraviolet lithography,
    Takahiro Kozawa, The 40th International Conference of Photopolymer Science and Technology 2023
  4. Application of machine learning to development of chemically amplified resist materials and processes,
    Takahiro Kozawa, The 39th International Conference Photopolymer Science and Technology 2022
  5. EUVL Stochastics Symposium,
    Takahiro Kozawa, 34th International Microprocesses and Nanotechnology Conference2021
  6. Study on beam-induced transient reaction process of carboxylic acids used as ligands of metal oxide nanocluster resists,
    Yusa Muroya, Kengo Ikeuchi, Tomoe Otsuka, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana and Takahiro Kozawa , 34th International Microprocesses and Nanotechnology Conference 2021
  7. Resist thickness dependence of latent images in chemically amplified resists used for electron beam lithography,
    Takahiro Kozawa and Takao Tamura, The 38th International Conference of Photopolymer Science and Technology 2021
  8. Mechanism of electron beam resists,
    Takahiro Kozawa, The 27th Symposium on Photomask and Next Generation Lithography Mask Technology 2021
  9. Theoretical Study on Trade-off Relationships between Resolution, Line Edge Roughness, and Sensitivity in Resist Processes for Semiconductor Manufacturing by Extreme Ultraviolet Lithography,
    T. Kozawa, 32nd International Microprocesses and Nanotechnology Conference 2019
  10. Relationship between Resolution Blur and Stochastic Defect of Chemically Amplified Resists Used for Extreme Ultraviolet Lithography,
    Takahiro Kozawa, Julius Joseph Santillan, and Toshiro Itani, The 36th International Conference of Photopolymer Science and Technology 2019
  11. Lamellar Orientation of PSPMMA Block Copolymer via Electron-Beam Induced Porlarity Switch in Nitrophenyl Selfassembled monolayer (SAM), H. Yamamoto, G. Dawson, T. Kozawa, 31st International Microprocesses and Nanotechnology Conference 2018
  12. Stochasticity in EUV lithography, T. Kozawa, J.J.Santillan, T. Itani, 16th FRAUNHOFER IISB 2018